Substrate processing apparatus and substrate processing method
Abstract
A substrate processing apparatus includes an indexer block and a processing block adjacent to the indexer block in a lateral direction of the indexer block. A plurality of processing block layers are stacked in an up-down direction in the processing block. The indexer block includes a container holding portion and a first transfer robot that transfers a substrate between the substrate container held by the container holding portion and the processing block. Each of the processing block layers includes a plurality of processing units, a substrate placing portion, a dummy-substrate housing portion, and a second transfer robot that transfers a substrate between the substrate placing portion and the plurality of processing units and that transfers a dummy substrate between the dummy-substrate housing portion and the plurality of processing units.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A substrate processing apparatus comprising:
an indexer block; and a processing block that is adjacent to the indexer block in a lateral direction of the indexer block and in which a plurality of processing block layers are stacked in an up-down direction, the indexer block comprising:
a container holding portion that is configured to hold a substrate container that houses a substrate and to hold a dummy substrate container that houses a dummy substrate; and
a first transfer robot that transfers the substrate between the substrate container held by the container holding portion and the processing block,
each processing block layer comprising:
a plurality of processing units that perform substrate processing;
a substrate placing portion that temporarily holds the substrate that is delivered between the first transfer robot and the processing block layer and that temporarily holds the dummy-substrate that is delivered between the first transfer robot and the processing block layer;
a dummy-substrate housing portion that houses at least one dummy substrate that is usable in the plurality of processing units for dummy processing; and
a second transfer robot that transfers the substrate between the substrate placing portion and the plurality of processing units and that transfers the dummy substrate between the dummy-substrate housing portion and the plurality of processing units, and that transfers the dummy substrate between the dummy-substrate housing portion and the substrate placing portion.
2 . The substrate processing apparatus according to claim 1 , wherein the substrate placing portion is disposed between the first transfer robot and the second transfer robot, and the dummy-substrate housing portion is disposed between the first transfer robot and the second transfer robot.
3 . The substrate processing apparatus according to claim 1 , wherein, in each processing block layer, the plurality of processing units are arranged along a transfer path along which the substrate is transferred by the second transfer robot on both sides of the transfer path, and are stacked in the up-down direction.
4 . The substrate processing apparatus according to claim 1 , wherein the dummy-substrate housing portion is disposed at a height different from a height of the substrate placing portion.
5 . The substrate processing apparatus according to claim 4 , wherein the dummy-substrate housing portion is disposed so as to overlap the substrate placing portion when viewed in plan.
6 . The substrate processing apparatus according to claim 1 , wherein the plurality of processing block layers include a first processing block layer and a second processing block layer disposed above the first processing block layer,
in the first processing block layer, the dummy-substrate housing portion is positioned below the substrate placing portion, and in the second processing block layer, the dummy-substrate housing portion is positioned above the substrate placing portion.
7 . The substrate processing apparatus according to claim 1 , wherein the dummy-substrate housing portion of each processing block layer includes a plurality of dummy-substrate slots that are equal in number to the plurality of processing units included in the processing block layer, and each dummy-substrate slot is configured to hold a single of the at least one dummy substrate.
8 . The substrate processing apparatus according to claim 7 , wherein the plurality of processing units of each processing block layer are correlated with the plurality of dummy-substrate slots of the processing block layer in a one-to-one correspondence, and the second transfer robot transfers the dummy substrate between the dummy-substrate slot and the processing unit that correspond to each other.
9 . The substrate processing apparatus according to claim 1 , the substrate processing apparatus further comprising a controller configured to record a usage history of the dummy substrate housed in the dummy-substrate housing portion and to issue a warning based on the usage history of the dummy substrate when the dummy substrate reaches a usage limit.
10 . A substrate processing apparatus comprising:
an indexer block; and a processing block that is adjacent to the indexer block in a lateral direction of the indexer block and in which a plurality of processing block layers are stacked in an up-down direction, the indexer block comprising:
a container holding portion that holds a substrate container that houses a substrate; and
a first transfer robot that transfers the substrate between the substrate container held by the container holding portion and the processing block,
each processing block layer comprising:
a plurality of processing units that perform substrate processing;
a substrate placing portion that temporarily holds the substrate that is delivered between the first transfer robot and the processing block layer;
a dummy-substrate housing portion that houses at least one dummy substrate that is usable in the plurality of processing units for dummy processing; and
a second transfer robot that transfers the substrate between the substrate placing portion and the plurality of processing units and that transfers the dummy substrate between the dummy-substrate housing portion and the plurality of processing units,
wherein the dummy processing includes a maintenance process in which maintenance of the processing unit is performed.
11 . The substrate processing apparatus according to claim 10 , wherein the maintenance process includes at least one of a preparation process in which an environment is adjusted to process the substrate housed in the substrate container held by the container holding portion and a unit washing process in which an inside of the processing unit is washed and cleaned.Join the waitlist — get patent alerts
Track US2023307277A1 — get alerts on status changes and closely related new filings.
We store only your email — no account needed. See our privacy policy.