Methods and apparatus for generating atmospheric pressure, low temperature plasma

Abstract

A plasma generator generates atmospheric pressure, low temperature plasma (cold plasma), and includes a first electrode; a second electrode opposing the first electrode such that a bottom surface of the first electrode faces a top surface of the second electrode, the second electrode arranged so as to define a predetermined gap between the planar bottom surface of the first electrode and the planar top surface of the second electrode; a dielectric layer that is disposed on at least a part of the bottom surface of the first electrode having a relative permittivity between 2 and 500, and a thickness of 3 mm or less; and a power supply configured to supply electrical power to the first and second electrodes at a predetermined voltage and frequency, such that, based on the predetermined gap between the first electrode and the second electrode, atmospheric pressure, low temperature plasma is generated.

What is claimed is: 
     
         1 . A plasma generator apparatus for generating atmospheric pressure, low-temperature plasma, comprising:
 a first electrode that defines a planar bottom surface, the first electrode having a width and length that are each greater than a height extending in a height direction that is perpendicular to the planar bottom surface;   a second electrode that defines, a planar top surface, the second electrode having a width and length that are each greater than a height extending in the height direction that is perpendicular to the planar top surface, the second electrode opposing the first electrode such that the bottom surface of the first electrode faces the top surface of the second electrode, the second electrode arranged so as to define a predetermined gap between the planar bottom surface of the first electrode and the planar top surface of the second electrode;   a dielectric layer that is disposed on at least a part of the bottom surface of the first electrode having a relative permittivity between 2 and 500, and a thickness of 3 mm or less; and   a power supply configured to supply electrical power to the first and second electrodes at a predetermined voltage and frequency, such that, based on the predetermined gap between the first electrode and the second electrode, atmospheric pressure, low temperature plasma is generated.   
     
     
         2 . The plasma generator of  claim 1 , further comprising a spacer configured to support the first and second electrodes so as to define a predetermined gap between the second electrode and the dielectric layer. 
     
     
         3 . The plasma generator of  claim 1 , wherein the power supply includes an inverter that is configured to converts DC voltage to AC voltage and is configured to output AC20V-AC100V. 
     
     
         4 . The plasma generator of  claim 3 , wherein the inverter is configured to output AC25V-AC45V. 
     
     
         5 . The plasma generator of  claim 4 , wherein the inverter is configured to output AC30V-AC35V. 
     
     
         6 . The plasma generator of  claim 5 , wherein the inverter is configured to output approximately AC33.3V. 
     
     
         7 . The plasma generator of  claim 1 , wherein the inverter is configured to output an applied voltage with a frequency ranging from 30 Hz-90 Hz. 
     
     
         8 . The plasma generator of  claim 7 , wherein the inverter is configured to output an applied voltage with a frequency ranging from 50 Hz-70 Hz. 
     
     
         9 . The plasma generator of  claim 8 , wherein the inverter is configured to output an applied voltage with a frequency that is approximately 60 Hz. 
     
     
         10 . The plasma generator of  claim 1 , wherein the power supply includes a booster that receives the output of the inverter and boosts the received voltage at a rate of 150× at 2× intervals, ranging from 3 kV-15 kV. 
     
     
         11 . The plasma generator of  claim 10 , wherein the booster boosts the applied voltage at a rate of 150× at 2× intervals, ranging from 4 kV-7.5 kV. 
     
     
         12 . The plasma generator of  claim 11 , wherein the booster boosts the applied voltage at a rate of 150× at 2× intervals that is approximately 5 kV. 
     
     
         13 . The plasma generator of  claim 1 , further comprising a fan configured to move gas to contact the generated plasma, and an ozone decomposition filter to separate ozone from the gas that has contacted the generated plasma. 
     
     
         14 . The plasma generator of  claim 1 , wherein, for the dielectric layer, the relative permittivity is between 2 and 15, and thickness is between 1 mm and 3 mm. 
     
     
         15 . The plasma generator of  claim 1 , wherein, for the dielectric layer, the relative permittivity is between 15 and 100, and thickness is less than 2 mm. 
     
     
         16 . The plasma generator of  claim 1 , wherein, for the dielectric layer, the relative permittivity is between 100 and 500, and thickness is less than 1 mm. 
     
     
         17 . The plasma generator of  claim 1 , further comprising a second dielectric layer that is disposed on at least a part of the top surface of the second electrode having a relative permittivity between 2 and 500, and a thickness of 3 mm or less.