US2023257331A1PendingUtilityA1

Systems and Methods for Purifying Solvents

70
Assignee: FUJIFILM ELECTRONIC MAT USA INCPriority: Mar 27, 2020Filed: Apr 24, 2023Published: Aug 17, 2023
Est. expiryMar 27, 2040(~13.7 yrs left)· nominal 20-yr term from priority
Inventors:Eduardo Ramirez RomeroDavid Bollinger
B01D 71/262B01D 71/261B01D 2311/2512C07C 29/80B01D 15/08B01D 71/26B01D 71/36B01D 2257/80B01D 2311/2623C07C 29/76B01D 69/02B01D 61/147B01D 2317/02B01D 2317/04B01D 2311/2669C07C 31/10
70
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Claims

Abstract

The present disclosure is directed to methods and systems of purifying solvents. The purified solvents can be used for cleaning a semiconductor substrate in a multistep semiconductor manufacturing process.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A cleaning composition, comprising:
 isopropyl alcohol in an amount of at least 99.99 wt % of the composition; and   a total amount of metal impurities of at most about 200 ppt of the composition.   
     
     
         2 . The composition of  claim 1 , wherein the composition comprises a metal impurity in an amount of at most about 20 ppt of the composition. 
     
     
         3 . The composition of  claim 1 , wherein the composition comprises Fe in an amount of at most about 20 ppt of the composition. 
     
     
         4 . The composition of  claim 1 , wherein the composition comprises Ni in an amount of at most about 20 ppt of the composition. 
     
     
         5 . The composition of  claim 1 , wherein the composition comprises Cr in an amount of at most about 20 ppt of the composition. 
     
     
         6 . The composition of  claim 1 , wherein the composition comprises Zn in an amount of at most about 20 ppt of the composition. 
     
     
         7 . The composition of  claim 1 , wherein the composition comprises Cu in an amount of at most about 20 ppt of the composition. 
     
     
         8 . The composition of  claim 1 , wherein the composition comprises K in an amount of at most about 20 ppt of the composition. 
     
     
         9 . The composition of  claim 1 , wherein the composition comprises Na in an amount of at most about 20 ppt of the composition. 
     
     
         10 . The composition of  claim 1 , wherein the composition comprises Ca in an amount of at most about 20 ppt of the composition. 
     
     
         11 . The composition of  claim 1 , wherein the composition comprises a total amount of organic impurities of at most about 1000 ppb of the composition. 
     
     
         12 . The composition of  claim 1 , wherein the composition comprises water in an amount of at most about 100 ppm of the composition. 
     
     
         13 . The composition of  claim 1 , wherein the composition comprises n-propanol in an amount of at most 7 ppm of the composition. 
     
     
         14 . The composition of  claim 1 , wherein the composition comprises acetone in an amount of at most 8.8 ppm of the composition. 
     
     
         15 . A cleaning composition, comprising:
 isopropyl alcohol in an amount of at least 99.99 wt % of the composition; and   a total amount of organic impurities of at most about 1000 ppb of the composition.   
     
     
         16 . The composition of  claim 15 , wherein the composition comprises a metal impurity in an amount of at most about 20 ppt of the composition. 
     
     
         17 . The composition of  claim 15 , wherein the composition comprises water in an amount of at most about 100 ppm of the composition. 
     
     
         18 . The composition of  claim 15 , wherein the composition comprises n-propanol in an amount of at most 7 ppm of the composition. 
     
     
         19 . The composition of  claim 15 , wherein the composition comprises acetone in an amount of at most 8.8 ppm of the composition. 
     
     
         20 . A cleaning composition, comprising:
 isopropyl alcohol in an amount of at least 99.99 wt % of the composition; and   water in an amount of at most about 50 ppm of the composition.   
     
     
         21 . The composition of  claim 20 , wherein the composition comprises a total amount of metal impurities of at most about 200 ppt of the composition. 
     
     
         22 . The composition of  claim 20 , wherein the composition comprises a metal impurity in an amount of at most about 20 ppt of the composition. 
     
     
         23 . The composition of  claim 20 , wherein the composition comprises a total amount of organic impurities of at most about 1000 ppb of the composition. 
     
     
         24 . The composition of  claim 20 , wherein the composition comprises n-propanol in an amount of at most 7 ppm of the composition. 
     
     
         25 . The composition of  claim 20 , wherein the composition comprises acetone in an amount of at most 8.8 ppm of the composition.

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