Dual-pattern optical 3d dimensioning

Abstract

An optical dimensioning system includes one or more light emitting assemblies configured to project one or more predetermined patterns on an object; an imaging assembly configured to sense light scattered and/or reflected off the object, and to capture an image of the object while the patterns are projected; and a processing assembly configured to analyze the image of the object to determine one or more dimension parameters of the object. The light emitting assembly may include a single piece optical component configured for producing a first pattern and second pattern. The patterns may be distinguishable based on directional filtering, feature detection, feature shift detection, or the like. A method for optical dimensioning includes illuminating an object with at least two detectable patterns; and calculating dimensions of the object by analyzing pattern separate of the elements comprising the projected patterns. One or more pattern generators may produce the patterns.

What is claimed is: 
     
         1 . A dimensioning assembly comprising:
 a light emitting assembly;   a full field modulation mask disposed to modulate, into a random pattern, light received from the light emitting assembly; and   projecting optics comprising at least a projection lens disposed to project the random pattern without duplication optical elements.   
     
     
         2 . The dimensioning assembly of  claim 1 , wherein the projecting optics further comprises a field correction component. 
     
     
         3 . The dimensioning assembly of  claim 1 , wherein the projecting optics further comprises a uniform intensity distribution component. 
     
     
         4 . The dimensioning assembly of  claim 1 , further comprising:
 a camera module having one or more image sensors and an imaging lens assembly; and   a processing system configured to detect and analyze positions of elements of the generated patterns.   
     
     
         5 . The dimensioning assembly of  claim 1 , wherein the random pattern comprises a binary state produced by a physical mask layer or a modulation scheme. 
     
     
         6 . The dimensioning assembly of  claim 5 , wherein each feature of the binary state random pattern is associated with an elongated line orientation. 
     
     
         7 . The dimensioning assembly of  claim 1 , wherein the random pattern comprises a multi-state random pattern comprising features associated with at least three states. 
     
     
         8 . The dimensioning assembly of  claim 7 , wherein each feature state of the multi-state random pattern is associated with a different feature position shift. 
     
     
         9 . The dimensioning assembly of  claim 1 , wherein the light emitting assembly comprises one or more light generation sources to produce light patterns. 
     
     
         10 . The light emitting assembly of  claim 9 , wherein the light generation source comprises one or more laser modules. 
     
     
         11 . A method comprising:
 receiving light from a light emitting assembly;   modulating, by a full field modulation mask the received light into a random pattern; and   projecting the random pattern without duplication optical elements by a projecting optics comprising at least a projection lens.   
     
     
         12 . The method of  claim 11 , wherein the projecting optics further comprises a field correction component. 
     
     
         13 . The method of  claim 11 , wherein the projecting optics further comprises a uniform intensity distribution component. 
     
     
         14 . The method of  claim 11 , further comprising:
 detecting and analyzing positions of elements of the generated patterns by a processing system.   
     
     
         15 . The method of  claim 11 , wherein the random pattern comprises a binary state produced by a physical mask layer or a modulation scheme. 
     
     
         16 . The method of  claim 15 , wherein each feature of the binary state random pattern is associated with an elongated line orientation. 
     
     
         17 . The method of  claim 11 , wherein the random pattern comprises a multi-state random pattern comprising features associated with at least three states. 
     
     
         18 . The method of  claim 17 , wherein each feature state of the multi-state random pattern is associated with a different feature position shift. 
     
     
         19 . The method of  claim 11 , wherein the light emitting assembly comprises one or more light generation sources to produce light patterns. 
     
     
         20 . The method of  claim 19 , wherein the light generation source comprises one or more laser modules.