Chemical liquid manufacturing apparatus

Abstract

A chemical liquid manufacturing apparatus is provided. The manufacturing apparatus at least includes an ion exchange medium and an ion adsorption medium configured downstream from the ion exchange medium. A material of the ion adsorption medium includes a resin material having an amide bond or an imide bond.

What is claimed is: 
     
         1 . A chemical liquid manufacturing apparatus configured to process a material, the apparatus comprising:
 one or plural ion exchange media; and   one or plural ion adsorption media.   
     
     
         2 . The chemical liquid manufacturing apparatus of  claim 1 , wherein a material of the one or plural ion adsorption media comprises a resin having an amide bond or an imide bond. 
     
     
         3 . The chemical liquid manufacturing apparatus of  claim 2 , wherein the material of the one or plural ion adsorption media comprises nylon and/or a polyimide resin. 
     
     
         4 . The chemical liquid manufacturing apparatus of  claim 1 , wherein at least one of the one or plural ion adsorption media is positioned at a downstream side of the one or plural ion exchange media. 
     
     
         5 . The chemical liquid manufacturing apparatus of  claim 1 , wherein the one or plural ion adsorption media has a pore size of about 10 nm or less. 
     
     
         6 . The chemical liquid manufacturing apparatus of  claim 1 , wherein the one or plural ion adsorption media has a pore size of about 20 nm or greater. 
     
     
         7 . The chemical liquid manufacturing apparatus of  claim 1 , wherein the one or plural ion exchange media and the one or plural ion adsorption media are configured to process the material for less than two times. 
     
     
         8 . The chemical liquid manufacturing apparatus of  claim 1  configured to process the material comprising an organic solvent containing a metal component, wherein a content of the metal component is about 0.1 to 1000 mass ppt. 
     
     
         9 . The chemical liquid manufacturing apparatus of  claim 1  configured to process the material selecting from the group consisting of methanol, ethanol, 1-propanol, isopropanol, monomethyl ether, propylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monopropyl ether, propylene glycol monomethyl ether acetate, ethyl lactate, methyl methoxypropionate, cyclopentanone, cyclohexanone, γ-butyrolactone, diisoamyl ether, butyl acetate, 4-methyl-2-pentanol, and a combination thereof. 
     
     
         10 . The chemical liquid manufacturing apparatus of  claim 1  further comprising at least one particle removal medium having a pore size of about 50 nm or more.