Charged Particle Beam Apparatus and Cleaning Method

Abstract

To provide a charged particle beam apparatus. The charged particle beam apparatus includes: a stage on which a sample is placed; a cleaner configured to remove a contaminant on the sample; and a stage control unit configured to adjust a relative positional relationship between the cleaner and the sample by moving the stage during use of the cleaner.

1 . A charged particle beam apparatus comprising:
 a stage on which an object is placed;   a lens barrel in which the object is scanned with a charged particle beam;   a cleaner configured to remove a contaminant on the object by changing a hydrocarbon-based molecule adsorbed or adhered to a surface of the object to carbon monoxide or carbon dioxide from a direction different from a direction in which the lens barrel is disposed;   a stage control unit configured to adjust a relative positional relationship between the cleaner and the object by moving the stage during use of the cleaner;   wherein the stage control unit is configured to move the stage such that a distance between the object and the cleaner is smaller than a predetermined value which serves as a reference for increasing a cleaning effect.   
     
     
         2 . The charged particle beam apparatus according to  claim 1 , wherein
 the stage control unit is configured to move the stage based on a shape of the object.   
     
     
         3 . The charged particle beam apparatus according to  claim 1 , wherein
 the stage control unit is configured to move the stage based on a position of the lens barrel.   
     
     
         4 . The charged particle beam apparatus according to  claim 1 , wherein
 the stage control unit is configured to continuously move the stage during operation of the cleaner.   
     
     
         5 . The charged particle beam apparatus according to  claim 1 , wherein
 the stage control unit is configured to rotate the stage during operation of the cleaner.   
     
     
         6 . The charged particle beam apparatus according to  claim 1 , wherein
 the stage control unit is configured to tilt the stage such that the cleaner is positioned in a normal direction of the stage.   
     
     
         7 . The charged particle beam apparatus according to  claim 1 , further comprising:
 a cleaner control unit configured to control the cleaner; and   a processor configured to transmit an instruction signal to the stage control unit and the cleaner control unit.   
     
     
         8 . A charged particle beam apparatus comprising:
 a stage on which an object is placed;   a lens barrel in which the object is scanned with a charged particle beam;   a cleaner configured to remove a contaminant on the object by changing a hydrocarbon-based molecule adsorbed or adhered to a surface of the object to carbon monoxide or carbon dioxide from a direction different from a direction in which the lens barrel is disposed;   a stage control unit configured to adjust a relative positional relationship between the cleaner and the object by moving the stage during use of the cleaner;   wherein the stage control unit is configured to move the stage such that a distance between the object and the cleaner is larger than a predetermined value which serves as a reference for reducing a cleaning effect.   
     
     
         9 . The charged particle beam apparatus according to  claim 8 , wherein
 the processor is configured to allow the stage control unit and the cleaner control unit to be in conjunction with each other at a time set in advance by a user.   
     
     
         10 . A cleaning method performed by a charged particle beam apparatus, wherein the charged particle beam apparatus includes:
 a stage on which an object is placed;   a lens barrel in which the object is scanned with a charged particle beam;   a cleaner configured to remove a contaminant on the object by changing a hydrocarbon-based molecule adsorbed or adhered to a surface of the object to carbon monoxide or carbon dioxide from a direction different from a direction where the lens barrel is disposed;   a stage control unit configured to move the stage, the cleaning method comprising:   an adjusting step of adjusting, by the stage control unit, a relative positional relationship between the cleaner and the object by moving the stage during use of the cleaner;   wherein the stage control unit is configured to move the stage such that a distance between the object and the cleaner is smaller than a predetermined value which serves as a reference for increasing a cleaning effect.   
     
     
         11 . The cleaning method according to  claim 10 , wherein
 in the adjusting step, the stage is tilted such that the cleaner is positioned in a normal direction of the stage.   
     
     
         12 . The cleaning method according to  claim 10 , wherein
 in the adjusting step, the stage is rotated during operation of the cleaner.