Substrate cleaning device

Abstract

A first cleaner cleans an upper surface of a substrate by scanning above the substrate to pass through a first point in an outer edge of the substrate in a plan view. A second cleaner cleans an outer peripheral end of the substrate by coming into contact with a second point in the outer edge of the substrate in a plan view. A virtual first straight line passing through the first point and the second point and a virtual second straight line passing through a center of the substrate and is parallel to the first straight line are defined. A third cleaner is arranged below the substrate and opposite to the first cleaner and the second cleaner with the second straight line located between the third cleaner, and the first cleaner and the second cleaner, and cleans a lower surface of the substrate.

I/We claim: 
     
         1 . A substrate cleaning device comprising:
 a substrate holder that holds a circular substrate in a horizontal attitude;   a first cleaner that cleans an upper surface of the substrate by scanning above the substrate to pass through a first point in an outer edge of the substrate in a plan view;   a second cleaner that cleans an outer peripheral end of the substrate by coming into contact with a second point in the outer edge of the substrate in a plan view; and   a third cleaner that cleans a lower surface of the substrate, wherein   a virtual first line that passes through the first point and the second point and a virtual second straight line that passes through a center of the substrate and is parallel to the first straight line, and   the third cleaner is arranged below the substrate and opposite to the first cleaner and the second cleaner with the second straight line located between the third cleaner, and the first cleaner and the second cleaner.   
     
     
         2 . The substrate cleaning device according to  claim 1 , wherein
 a virtual third straight line extending from a center of the substrate to a geometric center of the third cleaner in a plan view and a third point in an outer edge of the substrate through which the third straight line passes in a plan view are further defined, and   the first cleaner, the second cleaner and the third cleaner are arranged such that the center of the substrate is located in a triangular region having the first point, the second point and the third point as vertexes.   
     
     
         3 . The substrate cleaning device according to  claim 2 , wherein
 a virtual fourth straight line extending from a center of the substrate toward the first point in a plan view and a virtual fifth straight line extending from the center of the substrate toward the second point in a plan view are further defined, and   each of a first angle between the third straight line and the fourth straight line and a second angle between the fourth straight line and the fifth straight line and a third angle between the fifth straight line and the third straight line is equal to or larger than 80 degrees.   
     
     
         4 . The substrate cleaning device according to  claim 3 , wherein
 each of the first angle, the second angle and the third angle is equal to or larger than 90 degrees.   
     
     
         5 . The substrate cleaning device according to  claim 3 , wherein
 the first angle is larger than the second angle.   
     
     
         6 . The substrate cleaning device according to  claim 3 , wherein
 the third angle is larger than the second angle.   
     
     
         7 . The substrate cleaning device according to  claim 1 , wherein
 the first cleaner cleans an upper surface of the substrate by scanning from a center of the substrate toward the first point in a plan view.   
     
     
         8 . The substrate cleaning device according to  claim 1 , wherein
 each of the substrate holder and the third cleaner has a circular outer shape, and   a diameter of the third cleaner is larger than a diameter of the substrate holder.   
     
     
         9 . The substrate cleaning device according to  claim 1 , wherein
 the third cleaner has a circular outer shape, and   a diameter of the third cleaner is larger than ⅓ of a diameter of the substrate.