Micro light emitting diode chip and method for manufacturing micro light emitting diode device including the same
Abstract
A micro-LED chip includes an epitaxial layered structure, and first and second electrodes. The epitaxial layered structure includes first-type and second-type semiconductor layers, and a light emitting layer sandwiched therebetween. The first and second electrodes are electrically connected to the first-type and second-type semiconductor layers, respectively. The micro-LED chip has a first distinctive region on an electrode surface of the first electrode. The first distinctive region has a surface morphology different from that of an adjacent region of the electrode surface of the first electrode. A method for manufacturing a micro-LED device including at least one micro-LED chip is also provided.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A micro light emitting diode (micro-LED) device, comprising:
a carrier substrate; a plurality of micro-LED chips which are disposed on the carrier substrate and spaced apart from each other, each of said micro-LED chips including:
an epitaxial layered structure that includes a first-type semiconductor layer, a light emitting layer and a second-type semiconductor layer sequentially disposed on said carrier substrate in such order;
a first electrode electrically connected to said first-type semiconductor layer; and
a second electrode electrically connected to said second-type semiconductor layer,
a plurality of metal wires each of which connects two adjacent ones of said micro-LED chips, wherein each of said micro-LED chips has a size that is equal to or smaller than 100 μm×100 μm, and wherein a total area of a projection of said first electrode on said first-type semiconductor layer and a projection of said second electrode on said first-type semiconductor layer is not smaller than 40% of an area of a projection of each of said micro-LED chips on an imaginary plane parallel to a semiconductor surface of said first-type semiconductor layer.
2 . The micro-LED device of claim 1 , further comprising a securing layer that is formed between said carrier substrate and said micro-LED chips.
3 . The micro-LED device of claim 2 , further comprising a plurality of supporters, each connecting a corresponding one of said micro-LED chips to said carrier substrate through said securing layer.
4 . The micro-LED device of claim 1 , wherein said first electrode and said second electrode are located on the same side of said epitaxial layered structure of each of said micro-LED chips.
5 . The micro-LED device of claim 1 , further comprising a material layer that includes an oxide or a nitride, said material layer being formed on said second electrode of each of said micro-LED chips.
6 . The micro-LED device of claim 5 , wherein said material layer has a thickness ranging from 0.1 μm to 5 μm.
7 . The micro-LED device of claim 1 , wherein said micro-LED chips are electrically connected to each other in series through said metal wires.
8 . The micro-LED device of claim 1 , wherein each of said micro-LED chips has a thickness that is equal to or smaller than 20 μm.
9 . The micro-LED device of claim 1 , wherein said first-type semiconductor layer is one of a p-type semiconductor layer and an n-type semiconductor layer, and said second-type semiconductor layer is the other one of said p-type semiconductor layer and said n-type semiconductor layer.
10 . A micro light emitting diode (micro-LED) device, comprising:
a carrier substrate; a plurality of micro-LED chips which are disposed on the carrier substrate and spaced apart from each other, each of said micro-LED chips including:
an epitaxial layered structure that includes a first-type semiconductor layer, a light emitting layer and a second-type semiconductor layer sequentially disposed on said carrier substrate in such order;
a first electrode electrically connected to said first-type semiconductor layer; and
a second electrode electrically connected to said second-type semiconductor layer,
a plurality of metal wires each of which connects two adjacent ones of said micro-LED chips, wherein each of said micro-LED chips has a size that is equal to or smaller than 100 μm×100 μm, and wherein said first electrode and said second electrode are disposed on opposite sides of said epitaxial layered structure.
11 . The micro-LED device of claim 10 , further comprising a securing layer that is formed between said carrier substrate and said micro-LED chips.
12 . The micro-LED device of claim 11 , further comprising a plurality of supporters, each connecting a corresponding one of said micro-LED chips to said carrier substrate through said securing layer.
13 . The micro-LED device of claim 10 , wherein each of said micro-LED chips has a thickness that is equal to or smaller than 20 μm.
14 . The micro-LED device of claim 10 , further comprising a material layer that includes metal, said material layer being formed on said second electrode of each of said micro-LED chips opposite to said second semiconductor layer.
15 . The micro-LED device of claim 14 , wherein said material layer and said metal wires are made of a same material.
16 . The micro-LED device of claim 14 , wherein said material layer and said metal wires are made of different materials.
17 . The micro-LED device of claim 14 , wherein said material layer has a thickness ranging from 0.1 μm to 5 μm.
18 . The micro-LED device of claim 17 , wherein said material layer is electrically connected to said second electrodes of said micro-LED chips so that said second electrodes have the same electrical potential.
19 . The micro-LED device of claim 10 , wherein said first electrodes of said micro-LED chips are electrically connected to each other through said metal wires so that said first electrodes have the same electrical potential.
20 . The micro-LED device of claim 10 , wherein said first-type semiconductor layer is one of a p-type semiconductor layer and an n-type semiconductor layer, and said second-type semiconductor layer is the other one of said p-type semiconductor layer and said n-type semiconductor layer.Join the waitlist — get patent alerts
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