US2022349058A1PendingUtilityA1

Substrate support unit, thin film deposition apparatus including the same, and substrate processing apparatus including the same

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Assignee: ASM IP HOLDING BVPriority: Oct 8, 2018Filed: Jul 14, 2022Published: Nov 3, 2022
Est. expiryOct 8, 2038(~12.2 yrs left)· nominal 20-yr term from priority
Inventors:Kichul UmJeunghoon HanDoohan KimYonggyu Han
H10P 72/7624H01J 37/32651H01J 37/32715H01J 37/32577C23C 16/45544C23C 16/4586C23C 16/46H01J 37/32724H01J 37/3244H01J 37/32532C23C 16/45536H01J 37/32082C23C 16/5096H01J 37/32522H10P 72/0402H10P 14/6336
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Claims

Abstract

A substrate support unit for thin film deposition on a substrate including a pattern structure and a thin film deposition apparatus including the substrate support unit includes a heater; an RF electrode; a first rod connected to the heater; a second rod connected to the RF electrode; and an RF shield spaced apart from the second rod, disposed to surround the second rod, and extending in an extension direction of the second rod.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A substrate support unit in which a substrate is seated on an upper portion, the substrate support unit comprising:
 a heater;   an RF electrode;   a first rod connected to the heater;   a second rod connected to the RF electrode; and   an RF shield spaced apart from the second rod, disposed to surround the second rod, and extending in an extension direction of the second rod.

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