Solid-state imaging device and electronic apparatus
Abstract
A solid-state imaging device includes a plurality of pixels each of which includes a photoelectric conversion unit that generates charges by photoelectrically converting light, and a transistor that reads a pixel signal of a level corresponding to the charges generated in the photoelectric conversion unit. A phase difference pixel which is at least a part of the plurality of pixels is configured in such a manner that the photoelectric conversion unit is divided into a plurality of photoelectric conversion units and an insulated light shielding film is embedded in a region for separating the plurality of photoelectric conversion units, which are divided, from each other.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A light detecting device comprising:
a pixel comprising:
a microlens disposed above a substrate;
a first photoelectric conversion region disposed in the substrate, the first photoelectric conversion region being configured to receive light through the micorolens; and
a second photoelectric conversion region disposed in the substrate, the second photoelectric conversion region being configured to receive light through the micorolens,
wherein a trench is formed in the substrate, and, in a plan view, at least a part of the trench is between the first photoelectric conversion region and the second photoelectric conversion region.
2 . The light detecting device according to claim 1 , wherein the trench is formed at a light incident surface of the substrate.
3 . The light detecting device according to claim 1 , further comprising a fixed charge film disposed in the trench.
4 . The light detecting device according to claim 1 , further comprising an insulating film disposed in the trench.
5 . The light detecting device according to claim 1 , wherein, in a plan view, the trench has a cross shape.
6 . The light detecting device according to claim 1 , further comprising a floating diffusion electrically connected to each of the first and second photoelectric conversion regions through a first transfer transistor and a second transfer transistor, respectively.
7 . The light detecting device according to claim 1 , wherein the first photoelectric conversion region and the second photoelectric conversion region are configured to receive light of a first color.
8 . The light detecting device according to claim 1 , wherein, in a plan view, a first dimension of the first photoelectric conversion region is larger than a second dimension of the first photoelectric conversion region, wherein the first dimension is parallel to the part of the trench and perpendicular to the second dimension.
9 . The light detecting device according to claim 8 , wherein, in a plan view, a third dimension of the second photoelectric conversion region is larger than a fourth dimension of the second photoelectric conversion region, wherein the third dimension is parallel to the part of the trench and perpendicular to the fourth dimension.
10 . An electronic apparatus comprising:
a lens; a signal processor; and a light detecting device comprising a pixel comprising:
a microlens disposed above a substrate;
a first photoelectric conversion region disposed in the substrate, the first photoelectric conversion region being configured to receive light through the micorolens; and
a second photoelectric conversion region disposed in the substrate, the second photoelectric conversion region being configured to receive light through the micorolens,
wherein a trench is formed in the substrate, and, in a plan view, at least a part of the trench is between the first photoelectric conversion region and the second photoelectric conversion region.Join the waitlist — get patent alerts
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