US2022315721A1PendingUtilityA1

Resin surface hydrophilization method, plasma processing device, laminate body, and laminate body manufacturing method

Assignee: KOMIYAMA ELECTRON CORPPriority: Aug 10, 2019Filed: Aug 6, 2020Published: Oct 6, 2022
Est. expiryAug 10, 2039(~13 yrs left)· nominal 20-yr term from priority
H10P 50/242C23C 14/02C23C 14/14C23C 14/562C23C 14/568H01J 37/32366H01J 37/32743H01J 37/32752H05K 2203/095C08J 7/123H05K 3/146H01J 2237/33C08J 2327/18H05K 3/381H01J 37/32899C23C 16/06H05K 3/1208C23C 16/02C08J 2333/06H01J 2237/336C08J 2367/00
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Claims

Abstract

[Problem]To provide a laminate body in which a resin base member and a metal deposition film are brought into firmly close contact with each other.[Solution]The laminate body manufacturing method includes a desorption step S10, an introduction step S20, a deposition step S30, and a coating step S40. In the desorption step S10, a hydrophobic surface of resin is irradiated with plasma to desorb at least some of the atoms constituting the resin from the surface. In the introduction step S20, the surface of the resin subjected to the desorption step S10 is irradiated with hydroxyl radicals to introduce a hydroxyl group onto the surface of the resin. In the deposition step S30, a metal film is deposited on the surface of the resin subjected to the introduction step S20. In the coating step S40, the surface of the metal film is coated with a metal layer formed of the same metal as the metal forming the metal film.

Claims

exact text as granted — not AI-modified
1 . A resin surface hydrophilization method, comprising:
 a desorption step of desorbing at least a part of atoms constituting resin from a hydrophobic surface of the resin by irradiating the surface with plasma; and   an introduction step of introducing a hydroxyl group on the surface of the resin subjected to the desorption step by irradiating the surface of the resin with hydroxyl radicals,   wherein the desorption step is performed at a first pressure equal to or higher than 0.1 Pa and equal to or lower than 0.4 Pa, and the introduction step is performed at a second pressure equal to or higher than 30% and equal to or lower than 50% of the first pressure.   
     
     
         2 . The resin surface hydrophilization method according to  claim 1 ,
 wherein the resin contains fluorine and carbon, and the atoms are fluorine and carbon.   
     
     
         3 . The resin surface hydrophilization method according to  claim 1 ,
 wherein the resin contains wholly aromatic polyester and the atoms are oxygen.   
     
     
         4 . The resin surface hydrophilization method according to  claim 1 ,
 wherein gas for generating the plasma contains at least one of nitrogen and argon,
 the desorption step and the introduction step are performed in a reduced pressure state, and 
 the introduction step is performed after the desorption step while the reduced pressure state is maintained. 
   
     
     
         5 . (canceled) 
     
     
         6 . The resin surface hydrophilization method according to  claim 1 ,
 wherein a voltage applied to a plasma irradiation source in the desorption step is set to change with time.   
     
     
         7 . The resin surface hydrophilization method according to  claim 1 ,
 wherein a plurality of plasma irradiation sources are used in the desorption step, and   voltages applied to the respective plasma irradiation sources are set to change in relation to the order in which the resin to be processed is irradiated.   
     
     
         8 . The resin surface hydrophilization method according to  claim 1 ,
 wherein the introduction step is performed at a temperature of the resin being equal to or higher than 150° C. and equal to or lower than 300° C.   
     
     
         9 . A laminate body manufacturing method, comprising:
 a desorption step of desorbing at least a part of atoms constituting resin from a hydrophobic surface of the resin by irradiating the surface with plasma;   an introduction step of introducing a hydroxyl group on the surface of the resin subjected to the desorption step by irradiating the surface of the resin with hydroxyl radicals; and   a deposition step of depositing a metal film on a surface of the resin subjected to the introduction step,   wherein the desorption step is performed at a first pressure equal to or higher than 0.1 Pa and equal to or lower than 0.4 Pa, and the introduction step is performed at a second pressure equal to or higher than 30% and equal to or lower than 50% of the first pressure.   
     
     
         10 . The laminate body manufacturing method according to  claim 9 , further comprising a coating step of coating a surface of the metal film with a metal layer formed of the same metal as the metal forming the metal film. 
     
     
         11 . A plasma processing device, comprising:
 a first processing device including a first chamber, a first holding unit which holds resin, a first gas introduction unit which introduces, into the first chamber, first gas for desorbing at least a part of atoms constituting the resin from a surface of the resin when turned into plasma, and a first plasma generation unit which turns the first gas into plasma; and   a second processing device including a grounded second chamber, a second holding unit which holds the resin processed in the first chamber and to which a first DC voltage is applied, a second gas introduction unit which introduces, into the second chamber, second gas which generates hydroxyl radicals by being turned into plasma, and a second plasma generation unit which turns the second gas into plasma and to which a second DC voltage higher than the first DC voltage is applied.   
     
     
         12 . The plasma processing device according to  claim 11 ,
 wherein the second holding unit includes a heating unit.   
     
     
         13 . The plasma processing device according to  claim 11 , further comprising a third processing device including a third chamber, a third holding unit which holds the resin processed in the second chamber, and a metal deposition unit which deposits a metal on the resin held by the third holding unit. 
     
     
         14 . The plasma processing device according to  claim 13 ,
 wherein at least a part of an inner wall of the second chamber, the plasma generation unit, and components installed in the second chamber, to be in contact with the plasma, is made of the same metal as the metal.   
     
     
         15 . A laminate body, comprising:
 a resin base member in which a part of atoms present on a hydrophobic surface of resin is replaced with a hydroxyl group; and   a metal deposition film formed on a surface of the resin base member,   wherein a contact angle of the surface of the resin base member with water is equal to or smaller than 30°.   
     
     
         16 . The laminate body according to  claim 15 ,
 wherein the resin is polytetrafluoroethylene and the atoms are fluorine, or   the resin is liquid crystal polymer containing wholly aromatic polyester.

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