Controlled profile polishing platen

Abstract

Chemical-mechanical polishing assemblies may include an upper platen characterized by a first surface and a second surface opposite the first surface. The upper platen may define a recess in the second surface of the upper platen. The upper platen may define a flexure between the first surface and the second surface within the recess. The assemblies may include a polishing pad coupled with the first surface of the upper platen. The assemblies may include a plate coupled with the upper platen along the second surface of the upper platen. The plate may define a volume within the recess of the upper platen between the second surface of the upper platen and the plate.

1 . A polishing assembly comprising:
 an upper platen characterized by a first surface and a second surface opposite the first surface, wherein the upper platen defines a recess in the second surface of the upper platen, and wherein the upper platen defines a flexure between the first surface and the second surface within the recess;   a polishing pad coupled with the first surface of the upper platen; and   a plate coupled with the upper platen along the second surface of the upper platen, and defining a volume within the recess of the upper platen between the second surface of the upper platen and the plate.   
     
     
         2 . The polishing assembly of  claim 1 , wherein the recess defined within the second surface of the upper platen comprises an annular recess defined about the upper platen. 
     
     
         3 . The polishing assembly of  claim 1 , wherein the recess defined within the second surface of the upper platen is a stepped recess, wherein the plate is coupled with the upper platen along a recessed ledge within the stepped recess, and wherein the volume defined within the recess of the upper platen is sealed with an elastomeric element disposed between the plate and the second surface of the upper platen. 
     
     
         4 . The polishing assembly of  claim 1 , wherein one or more stops extend from the plate towards the flexure of the upper platen, and wherein the one or more stops define a maximum deflection distance for the flexure defined by the upper platen. 
     
     
         5 . The polishing assembly of  claim 4 , wherein the one or more stops comprise a plurality of stops, and wherein a first stop of the plurality of stops is characterized by a height different from a second stop of the plurality of stops. 
     
     
         6 . The polishing assembly of  claim 1 , further comprising:
 a pneumatic pump fluidly coupled with the volume within the recess of the upper platen, wherein a fluid line from the pneumatic pump couples with the plate.   
     
     
         7 . The polishing assembly of  claim 6 , further comprising:
 a compliant wall extending from the plate to the second surface of the upper platen within the recess, wherein the compliant wall divides the volume within the recess of the upper platen into a first zone and a second zone, and wherein the first zone is fluidly isolated from the second zone.   
     
     
         8 . The polishing assembly of  claim 7 , wherein the pneumatic pump comprises a first fluid line extending to the first zone and a second fluid line extending to the second zone, and wherein the pneumatic pump is operable to independently pump or purge each of the first zone and the second zone. 
     
     
         9 . The polishing assembly of  claim 1 , wherein the flexure is characterized by a varying cross-sectional thickness across the flexure. 
     
     
         10 . A polishing assembly comprising:
 an upper platen characterized by a first surface and a second surface opposite the first surface, wherein the upper platen defines a recess in the second surface of the upper platen, wherein the upper platen is characterized by a first cross-sectional thickness external to the recess, and wherein the upper platen is characterized by a second cross-sectional thickness along a portion defining the recess;   a polishing pad coupled with the first surface of the upper platen; and   a plate coupled with the upper platen along the second surface of the upper platen, wherein the plate defines a volume within the recess of the upper platen between the second surface of the upper platen and the plate.   
     
     
         11 . The polishing assembly of  claim 10 , wherein the second cross-sectional thickness is characterized by a thickness of less than or about 15 mm. 
     
     
         12 . The polishing assembly of  claim 10 , wherein a portion of the upper platen characterized by the second cross-sectional thickness of the upper platen is located across a central axis of the upper platen. 
     
     
         13 . The polishing assembly of  claim 10 , wherein one or more protrusions extend from the plate towards the upper platen, and wherein each protrusion of the one or more protrusions is characterized by an annular shape about the plate. 
     
     
         14 . The polishing assembly of  claim 10 , further comprising:
 a pneumatic pump fluidly coupled with the volume within the recess of the upper platen, wherein a fluid line from the pneumatic pump couples with the plate.   
     
     
         15 . The polishing assembly of  claim 14 , further comprising:
 a bellows extending from the plate to the second surface of the upper platen through the volume, wherein the bellows divides the volume within the recess of the upper platen into a first zone and a second zone, and wherein the first zone is fluidly isolated from the second zone.   
     
     
         16 . The polishing assembly of  claim 15 , wherein the pneumatic pump comprises a first fluid line extending to the first zone and a second fluid line extending to the second zone, and wherein the pneumatic pump is operable to independently pump into, or purge from, each of the first zone and the second zone. 
     
     
         17 . A polishing assembly comprising:
 an upper platen characterized by a first surface and a second surface opposite the first surface, wherein the upper platen defines a recess in the second surface of the upper platen, and wherein the upper platen defines a flexure between the first surface and the second surface within the recess;   a polishing pad coupled with the first surface of the upper platen;   a plate coupled with the upper platen along the second surface of the upper platen, and defining a volume within the recess of the upper platen between the second surface of the upper platen and the plate; and   a pneumatic pump fluidly coupled with the volume within the recess of the upper platen, wherein a fluid line from the pneumatic pump fluidly accesses the volume.   
     
     
         18 . The polishing assembly of  claim 17 , wherein the flexure is characterized by a varying cross-sectional area across the flexure. 
     
     
         19 . The polishing assembly of  claim 17 , further comprising:
 a compliant wall extending from the plate to the second surface of the upper platen through the volume, wherein the compliant wall divides the volume within the recess of the upper platen into a first zone and a second zone, wherein the first zone is fluidly isolated from the second zone, wherein the pneumatic pump comprises a first fluid line extending to the first zone and a second fluid line extending to the second zone, and wherein the pneumatic pump is operable to independently pump into, or purge from, each of the first zone and the second zone.   
     
     
         20 . The polishing assembly of  claim 17 , wherein one or more protrusions extend from the plate towards the upper platen, and wherein the one or more protrusions define a maximum inward deflection distance of the flexure.