US2022208734A1PendingUtilityA1

Stacked memory routing techniques

Assignee: MICRON TECHNOLOGY INCPriority: Sep 20, 2018Filed: Jan 24, 2022Published: Jun 30, 2022
Est. expirySep 20, 2038(~12.1 yrs left)· nominal 20-yr term from priority
Inventors:Brent Keeth
H10W 20/212H10W 70/65H10W 70/654H10W 70/05H10W 90/00H10W 90/724H10W 72/247H10W 72/244H10W 72/07254H10W 90/722H10W 72/252H10W 20/43H10W 20/20H10W 90/297H10W 90/26H10W 20/435G11C 11/402G11C 5/06G11C 5/04G11C 5/063G11C 5/025H01L 2224/16227H01L 25/0657H01L 2224/16147H01L 25/50H01L 23/481H01L 2224/17181H01L 2225/06517H01L 2225/06541H01L 2224/16146H01L 23/5283H01L 2225/06565H01L 2924/1436H01L 23/528H01L 25/18H01L 2225/06513H01L 24/16H01L 24/17H10W 72/20
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Claims

Abstract

Techniques for signal routing between a host and dynamic random-access memory (DRAM) are provided. In an example, a routing layer for a dynamic random-access memory die (DRAM can include multiple through silicon via (TSV) terminations configured to electrically couple with TSVs of the DRAM, an intermediate interface area, and multiple routing traces. the multiple TSV terminations can be arranged in multiple TSV areas. The multiple TSV areas can be arranged in two columns. The intermediate interface area can include multiple micro-pillar bump terminations configured to couple, via a micro-pillar bump, with corresponding micro-pillar bump terminations of a semiconductor interposer. The multiple routing traces can couple control TSV terminations of the multiple TSV areas with a corresponding micro-pillar bump termination of the intermediate interface.

Claims

exact text as granted — not AI-modified
1 . A routing layer for a dynamic random-access memory die (DRAM), the routing layer comprising:
 multiple through silicon via (TSV) terminations configured to electrically couple with TSVs of the DRAM, the multiple TSV terminations arranged in multiple TSV areas, the multiple TSV areas arranged in two columns;   an intermediate interface area including multiple micro-pillar bump terminations configured to couple, via a micro-pillar bump, with corresponding micro-pillar bump terminations of a semiconductor interposer, the intermediate interface area arranged between the two columns and also located between two adjacent TSV areas, of the multiple TSV areas, within one column of the two columns; and   multiple routing traces coupling each control TSV termination of the two adjacent TSV areas with a corresponding micro-pillar bump termination of the intermediate interface.

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