US2022084846A1PendingUtilityA1
Semiconductor manufacturing apparatus and method for manufacturing semiconductor device
Est. expirySep 10, 2038(~12.1 yrs left)· nominal 20-yr term from priority
Inventors:Hidekazu Hayashi
H10P 50/642H10P 72/0422H10P 72/0428H10P 72/0424H10P 72/78H10P 72/7606H10P 72/0448H01L 21/30604H01L 21/67075
65
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Claims
Abstract
A semiconductor manufacturing apparatus includes a mounting unit arranged to mount an annular member, having an annular shape, to a work substrate including a first substrate and a second substrate bonded to each other so that the annular member surrounds the first substrate. The apparatus further includes a holding unit arranged to hold the work substrate having the annular member mounted thereto. The apparatus further includes a first fluid supply unit arranged to supply a first fluid to the second substrate of the work substrate held by the holding unit.
Claims
exact text as granted — not AI-modified1 - 17 . (canceled)
18 . A method for manufacturing a semiconductor device, the method comprising:
mounting an annular member, having an annular shape, to a work substrate including a first substrate and a second substrate bonded to each other so that the annular member surrounds the first substrate; holding the work substrate having the annular member mounted thereto; and supplying a first fluid to the second substrate of the held work substrate.
19 . The method according to claim 18 , wherein the first fluid is an etching liquid used to perform etching of the second substrate.
20 . A method for manufacturing a semiconductor device, the method comprising:
holding a work substrate including a first substrate and a second substrate bonded to each other; supplying a first fluid to the second substrate of the held work substrate; and supplying a second fluid to a boundary between the first substrate and the second substrate.Join the waitlist — get patent alerts
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