Polishing pad assembly

Abstract

The present invention is directed to a method and apparatus for polishing stone and synthetic substrates. The apparatus uses a leather polishing pad to apply a finish to a stone or synthetic substrate. The pad has a specially designed fluid channeling pattern which cools by maintaining a quantity of liquid polishing slurry centrally of the pad for cooling purposes. The grit and amount of the abrasive used with the slurry varies based on the mechanical properties of the substrate.

I claim: 
     
         1 . A polishing pad assembly for use with a sanding machine comprising:
 a first pad, said first pad having an outer covering, said outer covering formed of two sheets of material attached centrally and peripherally to create an inner sleeve;   a water channeling component having a series of channels formed therein;   a water impervious component attached to said water channeling component;   said water channeling component and said water impervious component enclosed within said inner sleeve.   
     
     
         2 . The assembly of  claim 1  wherein said channels are spirally arranged and emanate from a central position of said assembly, said channels widening as they approach an edge region of said pad assembly. 
     
     
         3 . The assembly of  claim 1  wherein said water channel component is formed of a series of fluid controlling sections. 
     
     
         4 . The assembly of  claim 3  wherein said fluid controlling sections are attached to said water impervious component by an adhesive. 
     
     
         5 . The assembly of  claim 1  including a buffing pad for use with said sanding machine, the buffing pad used interchangeably with said first pad, said buffing pad having a plurality of score marks formed therein. 
     
     
         6 . The assembly of  claim 1  wherein said two sheets of material are made of leather. 
     
     
         7 . The assembly of  claim 5  wherein said buffing pad is made from open cell rubber.