US2022033973A1PendingUtilityA1

Electroless palladium plating bath

Assignee: UEMURA KOGYO KKPriority: Jul 28, 2020Filed: Jul 27, 2021Published: Feb 3, 2022
Est. expiryJul 28, 2040(~14 yrs left)· nominal 20-yr term from priority
C23C 18/44C23C 18/32C23C 18/1651
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Claims

Abstract

A plating bath at least contains a palladium compound, a reducing agent, a complexing agent, and a stabilizer. The stabilizer is an organic compound in which a divalent sulfur compound is bonded to a compound with a heterocyclic structure, and the organic compound contains neither a thiol group nor a disulfide bond.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . An electroless palladium plating bath at least comprising:
 a palladium compound; a reducing agent; a complexing agent; and a stabilizer,   the stabilizer being an organic compound in which a divalent sulfur compound is bonded to a compound with a heterocyclic structure, the organic compound containing neither a thiol group nor a disulfide bond.   
     
     
         2 . The bath of  claim 1 , wherein
 the stabilizer has a concentration ranging from 0.01 mg/L to 10 mg/L.   
     
     
         3 . The bath of  claim 1 , wherein
 the heterocyclic structure is a nitrogen-containing heterocyclic structure or a sulfur-containing heterocyclic structure.   
     
     
         4 . The bath of  claim 3 , wherein
 the compound with the heterocyclic structure is at least one selected from the group consisting of imidazole, imidazolidine, imidazoline, oxadiazole, oxazine, thiadiazole, thiazole, thiazolidine, tetrazole, triazine, triazole, piperazine, piperidine, pyrazine, pyrazole, pyrazolidine, pyridine, pyridazine, pyrimidine, pyrrole, pyrrolidine, benzothiazole, benzimidazole, isoquinoline, thiophene, tetrahydrothiophene, pentamethylene sulfide, and a derivative thereof.   
     
     
         5 . The bath of  claim 1 , wherein
 the divalent sulfur compound is at least one selected from the group consisting of: thiadiazole, thiazole, thiazolidine, benzothiazole, thiophene, tetrahydrothiophene, methanethiol, benzenethiol, pentamethylene sulfide, dimethyl sulfide, methyl mercaptan, ethyl mercaptan, allyl mercaptan, thiopropionic acid, thioacetic acid, ethyl methyl sulfide, 1-propanethiol, 2-propanethiol, 2-aminoethanethiol, 2-mercaptoethanol, 4-mercaptopyridine, dimethyl sulfoxide, thiazolidine, S-methyl thioacetate, ethyl sulfide, methylpropyl sulfide, 1-butanethiol, thioglycolic acid, 2-(methylthio)ethanol, 3-mercapto-1-propanol, 2-methylthiazoline, cyclopentanethiol, 2-methyltetrahydrothiophene, pentamethylene sulfide, thiomorpholine, S-methyl thiopropionate, 3-mercaptopropionic acid, and a derivative thereof.

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