Quartz glass crucible

Abstract

A quartz glass crucible (1) includes: a cylindrical crucible body (10) which has a bottom and is made of quartz glass; and a first crystallization-accelerator-containing coating film (13A) which is formed on an inner surface (10a) so as to cause an inner crystal layer composed of an aggregate of dome-shaped or columnar crystal grains to be formed on a surface-layer portion of the inner surface (10a) of the crucible body (10) by heating during a step of pulling up the silicon single crystal by a Czochralski method. The quartz glass crucible is intended to withstand a single crystal pull-up step undertaken for a very long period of time.

1 . A quartz glass crucible used for pulling up a silicon single crystal by a Czochralski method, comprising:
 a cylindrical crucible body which has a bottom and is made of quartz glass; and   a first crystallization-accelerator-containing coating film which is formed on an inner surface of the crucible body so as to cause an inner crystal layer composed of an aggregate of dome-shaped or columnar crystal grains to be formed on a surface-layer portion of the inner surface of the crucible body by heating during a step of pulling up the silicon single crystal.   
     
     
         2 . The quartz glass crucible according to  claim 1 ,
 wherein a ratio A/B between a maximum value A of a peak intensity at a diffraction angle 2θ of 20° to 25° and a maximum value B of a peak intensity at a diffraction angle 2θ of 33° to 40° obtained by analyzing the inner surface of the crucible body, on which the inner crystal layer is formed, by an X-ray diffraction method is 7 or less.   
     
     
         3 . The quartz glass crucible according to  claim 1 ,
 wherein the inner crystal layer has a dome-shaped crystal layer composed of the aggregate of dome-shaped crystal grains formed on the surface-layer portion of the inner surface of the crucible body, and a columnar crystal layer composed of the aggregate of columnar crystal grains immediately under the dome-shaped crystal layer.   
     
     
         4 . The quartz glass crucible according to  claim 3 ,
 wherein a ratio A/B between a maximum value A of a peak intensity at a diffraction angle 2θ of 20° to 25° and a maximum value B of a peak intensity at a diffraction angle 2θ of 33° to 40° obtained by analyzing the inner surface of the crucible body, on which the inner crystal layer is formed, by an X-ray diffraction method is less than 0.4.   
     
     
         5 . The quartz glass crucible according to  claim 3 ,
 wherein a crystallization accelerator contained in the first crystallization-accelerator-containing coating film is barium, and   a concentration of the barium in the inner surface of the crucible body is 3.9×10 16  atoms/cm 2  or more.   
     
     
         6 . The quartz glass crucible according to  claim 1 ,
 wherein a region having a predetermined width extending downward from a rim of an upper end of an inner surface of the crucible body is a crystallization-accelerator uncoated region in which the first crystallization-accelerator-containing coating film is not formed.   
     
     
         7 . The quartz glass crucible according to  claim 1 , further comprising:
 a second crystallization-accelerator-containing coating film which is formed on an outer surface of the crucible body so as to cause an outer crystal layer composed of an aggregate of dome-shaped or columnar crystal grains to be formed on a surface-layer portion of the outer surface of the crucible body by heating during the step of pulling up.   
     
     
         8 . The quartz glass crucible according to  claim 7 ,
 wherein a ratio AB between a maximum value A of a peak intensity at a diffraction angle 2θ of 20° to 25° and a maximum value B of a peak intensity at a diffraction angle 2θ of 33° to 40° obtained by analyzing the outer surface of the crucible body, on which the outer crystal layer is formed, by an X-ray diffraction method is 0.4 or more and 7 or less.   
     
     
         9 . The quartz glass crucible according to  claim 7 ,
 wherein a crystallization accelerator contained in the second crystallization-accelerator-containing coating film is barium, and   a concentration of the barium in the outer surface of the crucible body is equal to or more than 4.9×10 15  atoms/cm 2  and less than 3.9×10 16  atoms/cm 2 .   
     
     
         10 . The quartz glass crucible according to  claim 7 ,
 wherein a region having a predetermined width extending downward from a rim of the upper end of the outer surface of the crucible body is a crystallization-accelerator uncoated region in which the first crystallization-accelerator-containing coating film is not formed.   
     
     
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         31 . A quartz glass crucible used for pulling up a silicon single crystal by a Czochralski method, comprising:
 a cylindrical crucible body which has a bottom and is made of quartz glass; and   a crystallization-accelerator-containing coating film which is formed on an inner surface of the crucible body so as to cause an inner crystal layer composed of an aggregate of dome-shaped or columnar crystal grains to be formed on a surface-layer portion of the inner surface of the crucible body by heating during a step of pulling up the silicon single crystal,   wherein the crystallization-accelerator-containing coating film is a non-heated polymer film formed of: (i) a barium compound which is insoluble in water, and (ii) a thickener composed of a polymer in which the barium compound diffuses.   
     
     
         32 . The quartz glass crucible according to  claim 31 ,
 wherein a ratio AB between a maximum value A of a peak intensity at a diffraction angle 2θ of 20° to 25° and a maximum value B of a peak intensity at a diffraction angle 2θ of 33° to 40° obtained by analyzing the inner surface of the crucible body, on which the inner crystal layer is formed, by an X-ray diffraction method is 7 or less.   
     
     
         33 . The quartz glass crucible according to  claim 32 ,
 wherein the ratio AB between the maximum value A of the peak intensity at the diffraction angle 2θ of 20° to 25° and the maximum value B of the peak intensity at the diffraction angle 2θ of 33° to 40° obtained by analyzing the inner surface of the crucible body, on which the inner crystal layer is formed, by the X-ray diffraction method is 0.4 or more and 7 or less.   
     
     
         34 . The quartz glass crucible according to  claim 31 ,
 wherein a region having a predetermined width extending downward from a rim of the upper end of the inner surface of the crucible body is a crystallization-accelerator uncoated region in which the crystallization-accelerator-containing coating film is not formed.