Liquid crystal display device

Abstract

A liquid crystal display device includes a TFT substrate having a first alignment film and an opposing substrate having a second alignment film with liquid crystals sandwiched therebetween. One of the first and second alignment films, comprises a first polyimide produced via polyamide acid ester containing cyclobutane as a precursor and a second polyimide produced via polyamide acid as a precursor. The polyamide acid has a higher polarity than that of the polyamide acid ester. The one of the first and second alignment films is responsive to photo-alignment. A first side of the one of the first and second alignment films is adjacent to the liquid crystals, and a second side thereof is closer to one of the TFT substrate and the counter substrate than the first side. The first side contains more of the first polyimide and less of the second polyimide than the second side.

What is claimed is: 
     
         1 . A method for fabricating a liquid crystal display device including a TFT substrate having a photo-alignment film formed over a pixel electrode and a common electrode;
 an opposing substrate which faces the TFT substrate; and   a liquid crystal layer sandwiched between the TFT substrate and the opposing substrate;   wherein   the method comprising steps of:   forming a mixture material that is a material of the photo-alignment film on the TFT substrate,   imidizing the mixture material so that a precursor contained in the mixture material is imidized,   irradiating a polyimide formed from the imidized precursor with ultraviolet light for photo-alignment without heating; and   heating the polyimide to form the alignment film after the irradiation.   
     
     
         2 . The method for fabricating a liquid crystal display device according to  claim 1 ,
 wherein an irradiance level of the ultraviolet light is from 2000 to 5000 mJ/cm2, a temperature at which the TFT substrate and the opposing substrate are heated after the ultraviolet light irradiation is not less than 230° C., and an interval after the ultraviolet light irradiation until heating the TFT substrate and the opposing substrate is within one hour.   
     
     
         3 . The method for fabricating a liquid crystal display device according to  claim 1 ,
 wherein an irradiance level of the ultraviolet light is from 1000 to 7000 mJ/cm2, a temperature at which the TFT substrate and the opposing substrate are heated after the ultraviolet light irradiation is not less than 200%, and an interval after the ultraviolet light irradiation until heating the TFT substrate and the opposing substrate is within 24 hours.   
     
     
         4 . The method for fabricating a liquid crystal display device according to  claim 1 ,
 wherein an irradiance level of the ultraviolet light is from 500 to 8000 mJ/cm2, a temperature at which the TFT substrate and the opposing substrate are heated after the ultraviolet light irradiation is not less than 150%, and an interval after the ultraviolet light irradiation until heating the TFT substrate and the opposing substrate is within 168 hours.   
     
     
         5 . The method for fabricating a liquid crystal display device according to  claim 1 , further comprising: forming color filters on the opposing substrate. 
     
     
         6 . The method for fabricating a liquid crystal display device according to  claim 1 ,
 wherein the precursor is polyamide acid ester.   
     
     
         7 . The method for fabricating a liquid crystal display device according to  claim 1 ,
 wherein the precursor is polyamide acid.   
     
     
         8 . The method for fabricating a liquid crystal display device according to  claim 7 ,
 wherein the precursor includes cyclobutane.   
     
     
         9 . The method for fabricating  3  liquid crystal display device according to  claim 1 ,
 wherein the alignment film is separated into two layers.