US2021408308A1PendingUtilityA1
Device for photo spectroscopy having an atomic-scale bilayer
Est. expiryMar 11, 2039(~12.6 yrs left)· nominal 20-yr term from priority
H10F 77/127H10F 77/12H10F 30/28H10F 77/16H10F 77/147G01J 3/0259G01J 1/44H01L 31/0324H01L 31/032H01L 31/035281H01L 31/112
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Claims
Abstract
Aspects of the subject disclosure may include, for example, a photo detecting device that includes a bottom gate, a bilayer semiconductor formed on the bottom gate, and a top gate above the bilayer semiconductor comprising a polymer electrolyte. Other embodiments are disclosed.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A method, comprising:
applying, by a processing system including a processor, an electric field to a top gate and a bottom gate surrounding a bilayer semiconductor photodetector; and detecting, by the processing system, incident light striking the bilayer semiconductor photodetector.
2 . The method of claim 1 , wherein the method further comprises:
adjusting, by the processing system, the electric field between 0 and 1 V/nm.
3 . The method of claim 2 , wherein the bilayer semiconductor photodetector comprises a first layer of molybdenum selenide and a second layer of tungsten selenide.
4 . The method of claim 3 , wherein the incident light comprises a wavelength between near infrared and visible light.
5 . The method of claim 1 , wherein the bottom gate comprises lithium fluoride.
6 . The method of claim 5 , wherein the top gate comprises polyethylene oxide.
7 . The method of claim 6 , wherein the bilayer semiconductor photodetector has a thickness of two atoms.
8 . The method of claim 7 , wherein the bilayer semiconductor photodetector comprises molybdenum disulfide.
9 . The method of claim 7 , wherein the bilayer semiconductor photodetector comprises tungsten ditelluride.
10 . The method of claim 7 , wherein the bilayer semiconductor photodetector comprises titanium selenide.
11 . The method of claim 7 , wherein the bilayer semiconductor photodetector comprises titanium sulfide.
12 . The method of claim 7 , wherein the bilayer semiconductor photodetector comprises zirconium selenide.
13 . The method of claim 7 , wherein the bilayer semiconductor photodetector comprises molybdenum tungsten selenide.
14 . The method of claim 7 , wherein the bilayer semiconductor photodetector comprises a first layer of molybdenum selenide and a second layer of tungsten selenide.
15 . The method of claim 7 , further comprising applying one or more resonators to the bilayer semiconductor photodetector.
16 . The method of claim 15 , wherein the one or more resonators comprise silicon.
17 . A method, comprising:
forming a bottom gate comprising lithium fluoride; forming a bilayer semiconductor on the bottom gate comprising a thickness of two atoms; forming a top gate above the bilayer semiconductor comprising a solid polymer electrolyte; applying an electric field to the top gate and the bottom gate; and detecting incident light striking the bilayer semiconductor.
18 . The method of claim 17 , wherein the bilayer semiconductor comprises one or more of molybdenum disulfide, tungsten ditelluride, titanium selenide, titanium sulfide, zirconium selenide, and molybdenum tungsten selenide.
19 . The method of claim 17 , wherein the electric field is between 0 and 1 V/nm.
20 . A method of making a photodetector device, comprising:
forming a bottom gate comprising lithium fluoride; forming a bilayer semiconductor formed on the bottom gate comprising one or more of molybdenum disulfide, tungsten ditelluride, titanium selenide, titanium sulfide, zirconium selenide, and molybdenum tungsten selenide; forming a top gate above the bilayer semiconductor comprising a solid polymer electrolyte; and connecting an electrical source to the top gate and the bottom gate that facilitates an electric field applied across the top gate and the bottom gate.Join the waitlist — get patent alerts
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