Method of creating a design on a helmet
Abstract
A method of creating a design on complex curves and irregular contours of a protective helmet, quickly and without having to first disassemble the helmet. A design is transferred to a clear film/acetate, which is then exposed onto a photoresist mask, transferring the design to the photoresist mask. The mask is washed out creating blast-able areas in the design mask. The mask is adhered to an area of the helmet, which is otherwise covered with a sealed protective bag. Sandblasting/abrasive-blasting etches portions of the helmet surface through the blast-able area of the mask. Various colors or other special effects may be painted/applied onto the etched portions of the helmet surface. The protective bag and photoresist mask can be removed, and the painted areas buffed/polished in a final step.
Claims
exact text as granted — not AI-modifiedIt is claimed:
1 . A method of forming a design on a helmet, comprising:
transferring a design to a photoresist mask; exposing the photoresist mask to create an open area with the shape of the design; adhering the photoresist mask to an area on a helmet; securing a protective cover around the helmet except over the photoresist mask; sandblasting/abrasive-blasting the photoresist mask to etch portions of the helmet underneath the open (blast-able) area; applying paint to the etched portions of the helmet; removing the protective cover and photoresist mask from the helmet; and buffing the painted etched portions of the helmet.Join the waitlist — get patent alerts
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