US2021387307A1PendingUtilityA1

Method of creating a design on a helmet

Assignee: MICROPLASMA OZONE TECH INCPriority: Jun 15, 2020Filed: Jun 14, 2021Published: Dec 16, 2021
Est. expiryJun 15, 2040(~13.9 yrs left)· nominal 20-yr term from priority
B24C 1/04A42C 3/00A42C 2/00
23
PatentIndex Score
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Claims

Abstract

A method of creating a design on complex curves and irregular contours of a protective helmet, quickly and without having to first disassemble the helmet. A design is transferred to a clear film/acetate, which is then exposed onto a photoresist mask, transferring the design to the photoresist mask. The mask is washed out creating blast-able areas in the design mask. The mask is adhered to an area of the helmet, which is otherwise covered with a sealed protective bag. Sandblasting/abrasive-blasting etches portions of the helmet surface through the blast-able area of the mask. Various colors or other special effects may be painted/applied onto the etched portions of the helmet surface. The protective bag and photoresist mask can be removed, and the painted areas buffed/polished in a final step.

Claims

exact text as granted — not AI-modified
It is claimed: 
     
         1 . A method of forming a design on a helmet, comprising:
 transferring a design to a photoresist mask;   exposing the photoresist mask to create an open area with the shape of the design;   adhering the photoresist mask to an area on a helmet;   securing a protective cover around the helmet except over the photoresist mask;   sandblasting/abrasive-blasting the photoresist mask to etch portions of the helmet underneath the open (blast-able) area;   applying paint to the etched portions of the helmet;   removing the protective cover and photoresist mask from the helmet; and   buffing the painted etched portions of the helmet.

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