Polishing pad

Abstract

Object: Providing a polishing pad that is deformable with a smaller force. Solution: A polishing pad ( 1 ) according to an aspect of the invention includes a substrate ( 2 ) made of a piece of non-woven fabric. The substrate ( 2 ) has a flat-plate shape extending in a first direction perpendicular to a thickness direction and in a second direction perpendicular to both the thickness direction and the first direction. The substrate ( 2 ) is divided into a plurality of blocks ( 3 ) arranged in the second direction and each extending in the first direction. A boundary portion ( 4 ) extending in the first direction is formed between each pair of the blocks ( 3 ), and a plurality of slits ( 6 ) are formed in the boundary portion ( 4 ). Each of the slits ( 6 ) is formed through the substrate ( 2 ) in the thickness direction and extends in first direction. The plurality of slits ( 6 ) that exist in the boundary portion ( 4 ) are spaced apart from each other in the first direction. A pair of the blocks ( 3 ) that are next to each other in the second direction are connected to each other by a connection portion ( 7 ) formed between the slits ( 6 ).

1 . A polishing pad comprising a substrate made of a piece of non-woven fabric, wherein
 the substrate has a flat-plate shape extending in a first direction perpendicular to a thickness direction and in a second direction perpendicular to both the thickness direction and the second direction;   the substrate is divided into a plurality of blocks arranged in the second direction and each extending in the first direction;   a boundary portion extending in the first direction is formed between a pair of the blocks,   a plurality of slits are formed in the boundary portion through the substrate in the thickness direction and each of the slits extends in the first direction,   the plurality of slits that exist in the boundary portion are spaced apart from each other in the first direction; and   a pair of the blocks that are next to each other in the second direction are connected to each other by a connection portion formed between the slits.   
     
     
         2 . The polishing pad according to  claim 1 , wherein the connection portion of the boundary portion formed on a first side, in the second direction, of the block is located at a different position in the first direction from the position of the connection portion of the boundary portion formed on a second side of the block. 
     
     
         3 . The polishing pad according to  claim 1 , wherein the substrate has a bending strength in the second direction that is from 10 to 80% of the bending strength in the first direction of the substrate. 
     
     
         4 . The polishing pad according to  claim 1 , wherein
 the block has a dimension in the second direction ranging from 2 to 40 mm,   the slit has a dimension in the first direction ranging from 5 to 50 mm, and   the connection portion has a dimension in the first direction ranging from 5 to 50 mm.   
     
     
         5 . A polishing pad including a substrate made of a piece of non-woven fabric, wherein
 the substrate has a flat-plate shape extending in a first direction perpendicular to a thickness direction and in a second direction perpendicular to both the thickness direction and the first direction,   in the substrate, a slit extending in the thickness direction from a first principal surface in the thickness direction and extending in the first direction in the principal surface is formed, and   a plurality of the slits are formed in the second direction.