Photoresist composition and method of forming photoresist pattern

Abstract

A photoresist composition, comprising: a first polymer having one or more acid labile groups; a second polymer having fluorocarbon pendant groups; and metal oxide nanoparticles. The fluorocarbon pendant groups are attached to a main chain of the second polymer via a linking unit R1 of at least one selected from the group consisting of 1-9 carbon unbranched, branched, cyclic, noncylic, saturated, or unsaturated hydrocarbon with optional halogen substituents; —S—; —P—; —P(O2); —C(═O)S—; —C(═O)O—; —O—; —N—; —C(═O)N—; —SO2O—; —SO2S—; —SO—; —SO2—; and —C(═O)—.

What is claimed is: 
     
         1 . A photoresist composition, comprising:
 a first polymer having one or more acid labile groups;   a second polymer having fluorocarbon pendant groups; and   metal oxide nanoparticles,   wherein the fluorocarbon pendant groups are attached to a main chain of the second polymer via a linking unit R1 of at least one selected from the group consisting of 1-9 carbon unbranched, branched, cyclic, noncylic, saturated, or unsaturated hydrocarbon with optional halogen substituents; —S—; —P—; —P(O 2 ); —C(═O)S—; —C(═O)O—; —O—; —N—; —C(═O)N—; —SO 2 O—; —SO 2 S—; —SO—; —SO 2 —; and —C(═O)—.   
     
     
         2 . The photoresist composition of  claim 1 , wherein a layer of the second polymer has a thickness ranging from 0.1 nm to 20 nm. 
     
     
         3 . The photoresist composition of  claim 1 , wherein a contact angle of a layer of the second polymer to water is greater than 75°. 
     
     
         4 . The photoresist composition of  claim 1 , wherein the second polymer comprises from 0.1 wt. % to 10 wt. % of the fluorocarbon pendant groups based on a total weight of the second polymer. 
     
     
         5 . The photoresist composition of  claim 1 , wherein the fluorocarbon pendant groups are selected from the group consisting of C x F y  and —(C(CF 3 ) 2 OH)—, where 1≤x≤9 and 3≤y≤12. 
     
     
         6 . The photoresist composition of  claim 1 , wherein a main chain of the second polymer is a polyhydroxystyrene, a polyacrylate, or a polymer formed from a 1 to 10 carbon monomer. 
     
     
         7 . A photoresist composition, comprising:
 a photoresist polymer having one or more leaving groups selected from the group consisting of a carboxylic acid group, a phenolic alcohol group, a sulfonic group, a sulfonamide group, a sulfonylimido group, an (alkylsulfonyl) (alkylcarbonyl)methylene group, an (alkylsulfonyl)(alkyl-carbonyl)imido group, a bis(alkylcarbonyl)methylene group, a bis(alkylcarbonyl)imido group, a bis(alkylsylfonyl)methylene group, a bis(alkylsulfonyl)imido group, a tris(alkylcarbonyl methylene group, and a tris(alkylsulfonyl)methylene group;   a protective polymer having fluorocarbon pendant groups; and   one or more photoactive compounds.   
     
     
         8 . The photoresist composition of  claim 7 , wherein the fluorocarbon pendant groups are selected from the group consisting of C x F y  and —(C(CF 3 ) 2 OH)—, where 1≤x≤9 and 3≤y≤12. 
     
     
         9 . The photoresist composition of  claim 7 , wherein a main chain of the protective polymer is a polyhydroxystyrene, a polyacrylate, or a polymer formed from a 1 to 10 carbon monomer. 
     
     
         10 . The photoresist composition of  claim 7 , wherein the protective polymer comprises from 0.1 wt. % to 10 wt. % of the fluorocarbon pendant groups based on a total weight of the second polymer. 
     
     
         11 . The photoresist composition of  claim 7 , wherein the protective polymer has a weight average molecular weight of 3000 to 15,000. 
     
     
         12 . The photoresist composition of  claim 7 , wherein the protective polymer comprises from 0.1 wt. % to 10 wt. % of one or more polar functional groups selected from the group consisting of —OH, —NH 3 , —NH 2 , and —SO 3  based on a total weight of the second polymer. 
     
     
         13 . A photoresist composition, comprising:
 a photoresist material including a first polymer; and   a second polymer having fluorocarbon pendant groups,   wherein the fluorocarbon pendant groups are selected from the group consisting of C x F y  and —(C(CF 3 ) 2 OH)—, where 1≤x≤9 and 3≤y≤12.   
     
     
         14 . The photoresist composition of  claim 13 , wherein the photoresist material comprises metal oxide nanoparticles. 
     
     
         15 . The photoresist composition of  claim 13 , wherein a main chain of the second polymer is a polyhydroxystyrene, a polyacrylate, or a polymer formed from a 1 to 10 carbon monomer. 
     
     
         16 . The photoresist composition of  claim 13 , wherein the second polymer comprises from 0.1 wt. % to 10 wt. % of one or more polar functional groups selected from the group consisting of —OH, —NH 3 , —NH 2 , and —SO 3  based on a total weight of the second polymer. 
     
     
         17 . The photoresist composition of  claim 13 , wherein the second polymer comprises from 0.1 wt. % to 10 wt. % of the fluorocarbon pendant groups based on a total weight of the second polymer. 
     
     
         18 . The photoresist composition of  claim 13 , wherein the fluorocarbon pendant groups are attached to a polymer main chain via a linking unit of at least one selected from the group consisting of 1-9 carbon unbranched, branched, cyclic, noncylic, saturated, or unsaturated hydrocarbon with optional halogen substituents; —S—; —P—; —P(O 2 ); —C(═O)S—; —C(═O)O—; —O—; —N—; —C(═O)N—; —SO 2 O—; —SO 2 S—; —SO—; —SO 2 —; and —C(═O)—. 
     
     
         19 . The photoresist composition of  claim 13 , wherein the C x F y  is one or more selected from the group consisting of —C 2 F 5 , —CH 2 CH 2 C 3 F 7 , —(C(CF 3 ) 2 OH), —C(═O)OC 4 F 9 , —CH 2 OC 4 F 9 , and —C(═O)O(C(CF 3 ) 2 OH). 
     
     
         20 . The photoresist composition of  claim 13 , wherein the second polymer has a weight average molecular weight of 3000 to 15,000.