Hydrogen fluoride vapor phase corrosion apparatus and method

Abstract

A hydrogen fluoride vapor phase corrosion apparatus comprises a reaction chamber, a vapor phase hydrogen fluoride source, and a hydrogen fluoride vapor phase gain device. The reaction chamber is provided with a first gas inlet that is connected to the vapor phase hydrogen fluoride source, and a second gas inlet being connected to the hydrogen fluoride vapor phase gain device. The hydrogen fluoride vapor phase gain device is configured to perform a gas-liquid mixing and vaporizing of a prescribed organic liquid and introduce it into the reaction chamber through the second gas inlet after a wafer placed in the reaction chamber reacts with a vapor phase hydrogen fluoride admitted from the first gas inlet, so that the vaporized organic liquid and residual water in the reaction chamber form an azeotropic mixture that evaporates or volatilizes more readily than water.

What is claimed is: 
     
         1 . A hydrogen fluoride vapor phase corrosion apparatus, comprising a reaction chamber, a vapor phase hydrogen fluoride source, and a hydrogen fluoride vapor phase gain device,
 wherein the reaction chamber is provided with a first gas inlet and a second gas inlet, with the first gas inlet being connected to the vapor phase hydrogen fluoride source and the second gas inlet being connected to the hydrogen fluoride vapor phase gain device, and   the hydrogen fluoride vapor phase gain device is configured to perform a gas-liquid mixing and vaporizing of a prescribed organic liquid and introduce it into the reaction chamber through the second gas inlet after a wafer placed in the reaction chamber reacts with a vapor phase hydrogen fluoride admitted from the first gas inlet, so that the prescribed vaporized organic liquid and residual water on a surface of the wafer form an azeotropic mixture which evaporates or volatilizes more readily than water so as to be evaporated or volatilized easily from the surface of the wafer to be carried out.   
     
     
         2 . The hydrogen fluoride vapor phase corrosion apparatus of  claim 1 , wherein the prescribed organic liquid includes a prescribed alcohol organic substance and/or a prescribed ketone organic substance. 
     
     
         3 . The hydrogen fluoride vapor phase corrosion apparatus of  claim 1 , wherein the prescribed alcohol organic substance includes at least one of methanol, ethanol, and propanol, and the prescribed ketone organic substance includes acetone. 
     
     
         4 . The hydrogen fluoride vapor phase corrosion apparatus of  claim 1 , wherein the reaction chamber is further provided with a third gas inlet, and the third gas inlet is connected to a nitrogen gas source, and the nitrogen gas source is configured for introducing nitrogen gas into the reaction chamber through the third gas inlet to purge residual hydrogen fluoride gas in the reaction chamber after a vapor phase corrosion to the wafer by hydrogen fluoride and before the prescribed organic liquid is vaporized and introduced through the second gas inlet into the reaction chamber.