Method for the Removal and Recovery of Metals and Precious Metals from Substrates

Abstract

A method for removing metal and/or precious metal-containing depositions from substrates, wherein said substrate is subjected to treatment with an organo amine protectant component P and an inorganic active component A. Component P may be formed in situ by reaction with component R. Component P is an organic amine and/or organic amine hydrohalide and/or organic ammonium halide (preferably diisopropylamine hydrochloride), component A is an inorganic compound (preferably inorganic acid or a mixture thereof) and component R is an organic compound that can be split along the C—N bond by the component A into an organic amine (preferably dimethylformamide or N-methyl pyrrolidone). The metals in the form of organo-metallic complexes and/or metalorganic compounds are isolated and/or separated by means of different chemical reactions (preferably reduction reactions) and/or biosorption (preferably with seaweed or yeast). The isolated and/or separated organo-metallic complexes and/or metalorganic compounds are subjected to refinement process to form pure metals and/or pure precious metals. The substrates remain intact after the treatment.

1 . A method for removing metal and precious metal-containing depositions from a substrate, comprising the step of (i) treating the substrate with an organo amine protectant component (“P”) and an inorganic active component (“A”) or (ii) treating with a complexing component (“C”) and an “A”, wherein said component “P” or “C” is selected from the group consisting of mono-substituted amine hydrohalides, di-substituted amine hydrohalides, tri-substituted amine hydrohalides, and tetra-substituted ammonium halides, wherein each substituent is independently an alkyl having 1 to 18 carbon atoms or a cycloalkyl having 3 to 8 carbon atoms or an alkyl having 1 to 18 carbon atoms substituted by hydroxy-group or an alkyl having 1 to 18 carbon atoms substituted by carboxy-group or an alkyl having 1 to 18 carbon atoms substituted by hydroxy and carboxy group, and wherein said component “A” is an inorganic acid, a salt of an inorganic acid, or a mixture thereof. 
     
     
         2 . The method of  claim 1 , wherein said halide is chloride or fluoride or bromide or iodide. 
     
     
         3 . The method of  claim 1 , wherein said organo amine protectant is prepared in situ by reaction of an organic amine and hydrochloric- or hydrofluoric- or hydrobromic- or hydroiodic-acid. 
     
     
         4 . The method of  claim 1 , wherein said component “P” or “C” is selected from the group consisting of triethylamine hydrochloride, diethylamine hydrochloride, ethyl amine hydrochloride, cyclohexylamine hydrochloride, dicyclohexylamine hydrochloride, N,N dimethylcyclohexylamine hydrochloride, diisopropylamine hydrochloride, N ethylcyclohexylamine hydrochloride and N-methylcyclohexylamine hydrochloride, glycine betaine hydrochloride, choline chloride, carnitine chloride, tetra-n-butylammonium fluoride, tetraethylammonium bromide, methylamine hydroiodide. 
     
     
         5 . The method of  claim 1 , wherein said component “P” or “C” is selected from the group consisting of trimethylamine hydrohalide, dimethylamine hydrohalide and methylamine hydrohalide. 
     
     
         6 . The method of  claim 1 , wherein said component “P” or “C” is formed in situ by reaction of said component “A” with a reactive component “R”. 
     
     
         7 . The method of  claim 5 , wherein said component “R” is selected from the group consisting of organic amides and organic lactams. 
     
     
         8 . The method of  claim 6 , wherein said component “R” is dimethylformamide or N-methylpyrrolidone. 
     
     
         9 . The method of  claim 1 , wherein said component “A” is aqua regia. 
     
     
         10 . The method of  claim 1 , wherein said component “A” is selected from the group consisting of nitric acid, hydrofluoric acid, hydrochloric acid, phosphoric acid, hexafluorosilicic acid, ammonium peroxydisulfate and sulfuric acid and mixtures thereof. 
     
     
         11 . The method of  claim 1 , wherein said deposition comprises at least one material selected from the group consisting of Be, Mg, Ca, Ti, Zr, V, Nb, Ta, Cr, Mo, W, Mn, Fe, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd, B, Al, Ga, In, Ti, C, Si, Sn, N, P, As, S, Se, Te, their mixtures, and their chemical compounds. 
     
     
         12 . The method of  claim 1 , wherein said substrate comprises at least one material selected from the group consisting of aluminum, copper, steel, stainless steel, glass, titanium, aluminum alloys, copper alloys, steel alloys, stainless steel alloys, titanium alloys, graphite, carbon fiber, ceramic, fused silica, quartz, polymers, ores and blasting media selected from the group consisting of: corundum, sand, corn cob, plastic abrasives, silicon carbide, pumice, steel grit, steel shot, walnut shells, soda and glass beads. 
     
     
         13 . The method of  claim 1 , wherein said metal is recovered from the solution resulting from said treatment. 
     
     
         14 . The method of  claim 13 , wherein said recovery is carried out by means of a biosorbant. 
     
     
         15 . The method of  claim 14 , wherein said biosorbant is selected from seaweed and yeast. 
     
     
         16 . The method of  claim 15 , wherein the biosorbant is  Spirulina platensis.    
     
     
         17 . The method of  claim 15 , wherein the biosorbant is  Saccharomyces cerevisiae.    
     
     
         18 . The method of  claim 13 , wherein said recovery is carried out by means of a reducing agent. 
     
     
         19 . The method of  claim 18 , wherein the reducing agent is hydroxylamine hydrochloride, glucose, sodium bisulfite, sulfur dioxide. 
     
     
         20 . The method of  claim 13 , wherein said recovery is carried out by means of an organic acid. 
     
     
         21 - 37 . (canceled)