US2021242162A1PendingUtilityA1

Method of manufacturing semiconductor device

Assignee: SEDI INCPriority: Jun 26, 2018Filed: Apr 26, 2021Published: Aug 5, 2021
Est. expiryJun 26, 2038(~11.9 yrs left)· nominal 20-yr term from priority
Inventors:Fumio Yamada
H10W 72/07353H10W 72/07336H10W 72/334H10W 72/30H10W 72/20H10W 72/952H10W 72/923H10W 72/931H10W 72/352H10W 20/40H10W 40/10H10W 74/00H10W 70/60H10W 74/014H10W 95/00H10W 72/07236H10W 72/90H10W 70/24H01L 2224/26H01L 2224/32059H01L 24/32H01L 2924/01079H01L 24/08H01L 2924/38H01L 24/28H01L 2924/014
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Claims

Abstract

A method is disclosed for manufacturing a semiconductor device including a mounting substrate, a semiconductor chip, a rear-surface metal layer, an AuSn solder layer, and a solder blocking metal layer, is disclosed. The semiconductor chip is mounted on the mounting substrate, and includes front and rear surfaces, and a heat generating element. The rear-surface metal layer includes gold (Au). The AuSn solder layer is located between the mounting substrate and the rear surface to fix the semiconductor chip to the mounting substrate. The solder blocking metal layer is located between the rear surface and the mounting substrate, and in a non-heating region excluding a heating region in which the heat generating element is formed. The solder blocking metal layer includes at least one of NiCr, Ni and Ti and extends to an edge of the semiconductor chip. A void is provided between the solder blocking metal layer and the AuSn solder layer.

Claims

exact text as granted — not AI-modified
1 - 6 . (canceled) 
     
     
         7 . A method of manufacturing a semiconductor device, comprising:
 forming a rear-surface metal layer including gold (Au) on a rear surface of a semiconductor chip;   forming a solder blocking metal layer including at least one of nickel-chrome (NiCr), nickel (Ni) and titanium (Ti) on a part of the rear-surface metal layer; and   attaching a surface including the rear-surface metal layer and the solder blocking layer of the semiconductor chip to a mounting substrate with an AuSn solder.   
     
     
         8 . A method of manufacturing a semiconductor device, comprising:
 forming a solder blocking metal layer including at least one of nickel-chrome (NiCr), nickel (Ni) and titanium (Ti) on a rear surface of a semiconductor chip;   forming a rear-surface metal layer including gold (Au) on the rear surface of a semiconductor chip including the solder blocking metal layer;   exposing the solder blocking metal layer from the rear-surface metal layer; and   attaching a surface including the rear-surface metal layer and the solder blocking layer of the semiconductor chip to a mounting substrate with an AuSn solder layer.   
     
     
         9 . The method of manufacturing a semiconductor device according to  claim 7 , wherein the semiconductor chip includes a silicon carbide (SiC) substrate and the rear-surface metal layer is formed on the SiC substrate. 
     
     
         10 . The method of manufacturing a semiconductor device according to  claim 7 , wherein the mounting substrate is a bottom material of a package. 
     
     
         11 . The method of manufacturing a semiconductor device according to  claim 7 , wherein the attaching of the semiconductor chip is performed by a scrubbing process. 
     
     
         12 . The method of manufacturing a semiconductor device according to  claim 8 , wherein the semiconductor chip includes a silicon carbide (SiC) substrate and the rear-surface metal layer is formed on the SiC substrate. 
     
     
         13 . The method of manufacturing a semiconductor device according to  claim 8 , wherein the mounting substrate is a bottom material of a package. 
     
     
         14 . The method of manufacturing a semiconductor device according to  claim 8 , wherein the attaching of the semiconductor chip is performed by a scrubbing process.

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