US2021214837A1PendingUtilityA1

Method of manufacturing deposition mask, intermediate product to which deposition mask is allocated, and deposition mask

Assignee: DAINIPPON PRINTING CO LTDPriority: Oct 7, 2016Filed: Mar 31, 2021Published: Jul 15, 2021
Est. expiryOct 7, 2036(~10.2 yrs left)· nominal 20-yr term from priority
C23C 14/042C23F 1/02C23C 14/24C23C 14/04B05B 12/20C30B 25/04H05B 33/10B05C 21/005C22C 38/08C23F 1/28C23C 14/12H05K 3/143C23C 16/04C23C 14/243B05D 1/32H01L 51/50H10K 71/166H10K 71/00H10K 50/00
75
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Claims

Abstract

A deposition mask in which deformation of long sides is restrained is manufactured. A manufacturing method of a deposition mask includes a step of preparing a metal plate; a processing step of processing the metal plate into an intermediate product comprising: a plurality of deposition mask portions each including a pair of long sides and a pair of short sides, and having a plurality of through-holes formed therein; and a support portion that surrounds the plurality of deposition mask portions, and is partially connected to the short sides of the plurality of deposition mask portions; and a separation step of separating the deposition mask portions from the support portion to obtain the deposition mask. In the intermediate product, the long sides of the deposition mask portions are not connected to the support portion.

Claims

exact text as granted — not AI-modified
1 . An intermediate product having a plate-like shape and made of metal, to which a deposition mask including a pair of long sides and a pair of short sides, and having a plurality of through-holes formed therein is allocated, the intermediate product comprising:
 a deposition mask portion including a pair of long sides and a pair of short sides, and having a plurality of through-holes formed therein; and   a support portion that surrounds the deposition mask portion, and is partially connected to the short sides of the deposition mask portion;   wherein the long sides of the deposition mask portion are not connected to the support portion.   
     
     
         2 . An intermediate product having a plate-like shape and made of metal, to which a deposition mask including a pair of long sides and a pair of short sides, and having a plurality of through-holes formed therein is allocated, the intermediate product comprising:
 a deposition mask portion including a pair of long sides and a pair of short sides, and having a plurality of through-holes formed therein; and   a support portion that surrounds the deposition mask portion, and is partially connected to the deposition mask portion;   wherein a ratio of a part of the long side of the deposition mask portion, which part is connected to the support portion, is smaller than a ratio of a part of the short side of the deposition mask portion, which part is connected to the support portion.   
     
     
         3 . The intermediate product according to  claim 2 , wherein
 the ratio of the part of the long side of the deposition mask portion, which part is connected to the support portion, is calculated by dividing a sum of widths of portions of the long side, which portions are connected to the support portion, by a length of the long side, and   the ratio of the part of the short side of the deposition mask portion, which part is connected to the support portion, is calculated by dividing a sum of width of portions of the short side, which portions are connected to the support portion, by a length of the short side.   
     
     
         4 . The intermediate product according to  claim 2 , wherein
 the ratio of the part of the long side of the deposition mask portion, which part is connected to the support portion, is calculated by dividing the number of portions of the long side, which portions are connected to the support portion, by a length of the long side, and   the ratio of the part of the short side of the deposition mask portion, which part is connected to the support portion, is calculated by dividing the number of portions of the short side, which portions are connected to the support portion, by a length of the short side.   
     
     
         5 . The intermediate product according to  claim 2 , wherein
 an area of the long side of the deposition mask portion, which area is overlapped with the through-holes when the long side is seen along a width direction of the intermediate product, is not connected to the support portion.   
     
     
         6 . The intermediate product according to  claim 1 , wherein
 the short side of the deposition mask portion includes a plurality of projections projecting toward the support portion so as to be connected to the support portion.   
     
     
         7 . The intermediate product according to  claim 1 , wherein
 thicknesses of the deposition mask portion and the support portion are not more than 50 μm.   
     
     
         8 . The intermediate product according to  claim 1 , wherein
 a plurality of the deposition mask portions are aligned in a direction intersecting with the long sides, and   the support portion does not exist between the long sides of the adjacent two deposition mask portions.   
     
     
         9 . A deposition mask comprising:
 a base member having a plate-like shape and made of metal, the base member including a pair of long sides and a pair of short sides; and   a plurality of through-holes formed in the base member;   wherein a broken-out surface partially exists on the short side of the base member, while no broken-out surface exists on the long side of the base member.   
     
     
         10 . A deposition mask comprising:
 a base member having a plate-like shape and made of metal, the base member including a pair of long sides and a pair of short sides; and   a plurality of through-holes formed in the base member;   wherein a ratio of a broken-out surface in the long side of the base member is smaller than a ratio of a broken-out surface in the short side of the base member.   
     
     
         11 . The deposition mask according to  claim 10 , wherein
 the ratio of the broken-out surface in the long side of the base member is calculated by dividing a sum of widths of the broken-out surfaces present in the long side by a length of the long side, and   the ratio of the broken-out surface in the short side of the base member is calculated by dividing a sum of widths of the broken-out surfaces present in the short side by a length of the short side.   
     
     
         12 . The deposition mask according to  claim 10 , wherein
 the ratio of the broken-out surface in the long side of the base member is calculated by dividing the number of the broken-out surfaces present in the long side by a length of the long side, and   the ratio of the broken-out surface in the short side of the base member is calculated by dividing the number of the broken-out surfaces present in the short side by a length of the short side.   
     
     
         13 . The deposition mask according to  claim 10 , wherein
 the broken-out surface does not exist in an area that is overlapped with the through-holes when the long side is seen along a width direction of the deposition mask.   
     
     
         14 . The deposition mask according to  claim 9 , wherein
 the short side of the base member includes a plurality of projections each projecting outward and having the broken-out surface.   
     
     
         15 . The deposition mask according to  claim 9 , wherein
 a minimum distance from the long side of the base member up to the through-holes in a plane direction of the base member is not more than 50 μm.   
     
     
         16 . The deposition mask according to  claim 9 , wherein
 the base member has a first surface that faces a substrate to which a deposition material having passed through the through-holes adheres, and a second surface positioned oppositely to the first surface, and   the long side of the base member has a sectional shape that projects most outside at a part meeting the first surface.   
     
     
         17 . The deposition mask according to  claim 9 , wherein
 a thickness of the base member is not more than 50 μm.

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