Laminated structure and method for producing the same
Abstract
Disclosed herein is a laminated structure including a first layer covering a substrate and a raised portion existing on the substrate, and a second layer covering the first layer, in which a first seam is formed inside the first layer, starting from a part at which the raised portion rises from the substrate or a vicinity of the rising part as a start point, a second seam is formed inside the second layer, starting from a part at which the first layer positioned above the substrate rises or a part of the second layer corresponding to a vicinity of the rising part as a start point, and the first seam and the second seam are discontinuous.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A laminated structure comprising:
a first layer covering a substrate and a raised portion on the substrate, wherein a first seam is formed inside the first layer and extends from a first point of the raised portion to a second point of an upper surface of the first layer; and a second layer covering the first layer, wherein a second seam is formed inside the second layer and extends from a third point of a lower surface of the second layer to a fourth point of an upper surface of the second layer, and wherein a first straight line connecting the first point and the second point is discontinuous with a second straight line connecting the third point and the fourth point.
2 . The laminated structure according to claim 1 , wherein a third layer is interposed between the first layer and the second layer.
3 . The laminated structure according to claim 1 , wherein the first seam extends from a first step portion created by the raised portion and the second seam extends from a second step portion created by the raised portion.
4 . The laminated structure according to claim 1 , wherein an end point of the first seam is positioned above a start point of the second seam.
5 . The laminated structure according to claim 4 , wherein the end point of the first seam is 5 nm or more away from the start point of the second seam.
6 . A method for producing a laminated structure, the method comprising:
a first step of forming a first layer covering a substrate and a raised portion on the substrate, wherein a first seam is formed inside the first layer and extends from a first point of the raised portion to a second point of an upper surface of the first layer; and a second step of forming a second layer covering the first layer, wherein a second seam is formed inside the second layer and extends from a third point of a lower surface of the second layer to a fourth point of an upper surface of the second layer, and wherein a first straight line connecting the first point and the second point is discontinuous with a second straight line connecting the third point and the fourth point.
7 . The method for producing a laminated structure according to claim 6 , wherein a third layer is interposed between the first layer and the second layer.
8 . The method for producing a laminated structure according to claim 6 , wherein the first seam extends from a first step portion created by the raised portion and the second seam extends from a second step portion created by the raised portion.
9 . The method for producing a laminated structure according to claim 6 , wherein an end point of the first seam is positioned above a start point of the second seam.
10 . The method for producing a laminated structure according to claim 9 , wherein the end point of the first seam is 5 nm or more away from the start point of the second seam.Join the waitlist — get patent alerts
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