Vapor deposition mask, frame-equipped vapor deposition mask, vapor deposition mask preparation body, and method for producing organic semiconductor element

Abstract

A vapor deposition mask capable of correctly performing confirmation of whether a shape pattern of openings formed in a resin mask is normal or similar confirmation while satisfying both high definition and lightweight, a vapor deposition mask preparation body for obtaining the vapor deposition mask, a frame-equipped vapor deposition mask including the vapor deposition mask, and a method for producing an organic semiconductor element using the frame-equipped vapor deposition mask. The aforementioned problem is solved by using, in a vapor deposition mask including a metal mask in which a through hole is formed and a resin mask in which an opening corresponding to a pattern to be produced by vapor deposition is formed at a position overlapping with the through hole, the metal mask and the resin mask being stacked, wherein the resin mask has about 40% or less of light ray transmittance at a wavelength of about 550 nm.

1 . A vapor deposition mask comprising: a resin mask having an opening corresponding to a pattern to be produced by vapor deposition, wherein
 the resin mask has about 40% or less of light ray transmittance at a wavelength of about 550 nm.   
     
     
         2 . The vapor deposition mask according to  claim 1 , wherein
 the resin mask has about 10% or less of light ray transmittance at a wavelength of about 550 nm.   
     
     
         3 . The vapor deposition mask according to  claim 1 , wherein
 the resin mask has about 55% or less of light ray transmittance at a wavelength of about 450 nm to 650 nm.   
     
     
         4 . The vapor deposition mask according to  claim 1 , wherein
 the resin mask has about 55% or less of light ray transmittance at a wavelength of about 380 nm to 780 nm.   
     
     
         5 . The vapor deposition mask according to  claim 1 , wherein
 the resin mask contains a color material component.   
     
     
         6 . The vapor deposition mask according to  claim 5 , wherein
 the color material component is at least one selected from the group consisting of carbon black, black iron oxide, titanium oxide, and titanium dioxide.   
     
     
         7 . The vapor deposition mask according to  claim 5 , wherein
 a content of the color material component is about 20 mass % or less to a total mass of a resin material of the resin mask.   
     
     
         8 . The vapor deposition mask according to  claim 1 , wherein
 a color material layer is provided on the resin mask, and   a laminate of the resin mask and the color material layer has about 40% or less of light ray transmittance at a wavelength of about 550 nm.   
     
     
         9 . The vapor deposition mask according to  claim 8 , wherein
 a thickness of the laminate of the resin mask and the color material layer is about 3 μm or more and less than about 10 μm.   
     
     
         10 . The vapor deposition mask according to  claim 1 , wherein
 a thickness of the resin mask is about 3 μm or more and less than about 10 μm.   
     
     
         11 . The vapor deposition mask according to  claim 1 , wherein
 a thickness of the resin mask is about 30 μm or more.   
     
     
         12 . The vapor deposition mask according to  claim 1 , wherein
 the resin mask is equipped with a frame.