Treating anodized alloy substrates

Abstract

The present subject matter relates to treating anodized alloy substrates. An anodized alloy substrate is immersed in a titanium salt solution to deposit titanium ions in a surface of the anodized alloy substrate. The immersion results in the formation of a processed substrate. The processed substrate is anodized to form a finished substrate. The anodization oxidizes the titanium ions to titanium dioxide particles.

We claim: 
     
         1 . A method comprising:
 immersing an anodized alloy substrate in a titanium salt solution to deposit titanium ions in a surface of the anodized alloy substrate to form a processed substrate; and   anodizing the processed substrate to form a finished substrate, wherein the anodization oxidizes the titanium ions to titanium dioxide particles.   
     
     
         2 . The method of  claim 1 , wherein the titanium salt solution comprises at least one titanium salt selected from the group consisting of titanium acetate, titanium carbonate, titanium nitrate, titanium phosphate, titanium sulfate, titanium chloride, and combinations thereof. 
     
     
         3 . The method of  claim 2 , wherein the titanium salt solution comprises the at least one titanium salt in a weight percentage in a range of about 3-15%. 
     
     
         4 . The method of  claim 1 , further comprising:
 sealing the finished substrate to form a sealed substrate; and   baking the sealed substrate.   
     
     
         5 . The method of  claim 4 , wherein the baking of the sealed substrate is performed at a temperature, in a range of about 105-110° C. for a time period in a range of about 20-40 minutes. 
     
     
         6 . The method of  claim 4 , wherein the sealing is performed using a sealing agent comprising nickel acetate and nickel fluoride in a weight percentage in a range of about 0.6-5.0 g/L at a temperature in a range of about 25-95° C. 
     
     
         7 . The method of  claim 1 , wherein the titanium salt solution is maintained at a temperature in a range of about 30-50° C. 
     
     
         8 . The method of  claim 1 , wherein the titanium salt solution is maintained at a pH in a range of about 2-4. 
     
     
         9 . The method of  claim 1 , wherein the processed substrate is baked at a temperature in a range of about 105-110° C. for a time period in a range of about 10-15 minutes before anodizing it. 
     
     
         10 . A method comprising:
 anodizing an alloy substrate to form a first processed substrate, the first processed substrate having a plurality of pores in its surface;   immersing the first processed substrate in a titanium salt solution to deposit titanium ions into the plurality of pores, the deposition of the titanium ions forming a second processed substrate; and   anodizing the second processed substrate to form a finished substrate.   
     
     
         11 . The method of  claim 10 , wherein the titanium salt solution comprises at least one titanium salt selected from the group consisting of titanium acetate, titanium carbonate, titanium nitrate, titanium phosphate, titanium, sulfate, titanium chloride and combinations thereof. 
     
     
         12 . The method of  claim 10 , wherein the anodization of the alloy substrate is performed at a voltage in a range of about 10-120 V for a time period in a range of about 3-20 minutes and wherein the anodization of the second processed substrate is performed at a voltage in a range of about 10-120 V for a time period in a range of about 10-30 minutes. 
     
     
         13 . A method comprising:
 anodizing an aluminum alloy substrate to form a first processed substrate, the first processed substrate comprising a plurality of pores in its surface;   contacting the first processed substrate with a titanium salt solution to form a second processed substrate;   baking the second processed substrate to form a baked substrate; and   anodizing the baked substrate to form a finished aluminum substrate, wherein the finished aluminum substrate comprises titanium dioxide particles in the plurality of pores.   
     
     
         14 . The method of  claim 13 , further comprising:
 sealing the finished aluminum substrate to form sealed substrate; and   baking the sealed substrate at a temperature in a range of about 105-110° C. for a time period in a range of about 20-40 minutes.   
     
     
         15 . The method of  claim 13 , wherein baking of the second processed substrate is performed at a temperature in a range of about 105-110° C. for a time period in a range of about 10-15 minutes.