US2021156041A1PendingUtilityA1

Metallic coating and method of application

Assignee: HAMILTON SUNDSTRAND CORPPriority: Nov 22, 2019Filed: Nov 22, 2019Published: May 27, 2021
Est. expiryNov 22, 2039(~13.3 yrs left)· nominal 20-yr term from priority
C25D 3/665C25D 3/56
55
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Claims

Abstract

A method of depositing a high entropy metal alloy coating onto a substrate includes mixing metallic salts of one or more elements with a solvent to form a mixture, heating the mixture to form a liquid, such that constituents of the liquid are in a mobile ionic state, and electroplating the metallic salts onto a substrate from the ionic liquid. A solution for electroplating is also disclosed.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A method of depositing a metallic coating onto a substrate, comprising:
 mixing metallic salts of one or more elements with a solvent to form a mixture;   heating the mixture to form a liquid, such that constituents of the mixture are in a mobile ionic state; and   electroplating the metallic salts onto a substrate from the liquid.   
     
     
         2 . The method of  claim 1 , wherein the mixture has a eutectic point that is lower than about 100° C. 
     
     
         3 . The method of  claim 2 , wherein the heating is to a temperature at or near the eutectic point. 
     
     
         4 . The method of  claim 3 , wherein the heating is to a temperature that is between the eutectic point and a temperature 10° C. above the eutectic point. 
     
     
         5 . The method of  claim 2 , wherein the eutectic point is between about 10° C. and 100° C. 
     
     
         6 . The method of  claim 1 , wherein the one or more elements includes one or more refractory metals. 
     
     
         7 . The method of  claim 6 , wherein the one or more elements includes at least one of zirconium, niobium, titanium, tantalum, molybdenum, tungsten, rhenium, and hafnium, and combinations thereof. 
     
     
         8 . The method of  claim 6 , wherein the one or more elements includes at least one metal selected from the group of zirconium, niobium, titanium, tantalum, molybdenum, tungsten, rhenium, and hafnium. 
     
     
         9 . The method of  claim 1 , wherein the one or more elements includes at least one of zirconium, niobium, titanium, tantalum, molybdenum, tungsten, rhenium, and hafnium. 
     
     
         10 . The method of  claim 1 , wherein the substrate is a component of a gas turbine engine. 
     
     
         11 . The method of  claim 1 , wherein the substrate includes at least one non-line-of-sight surface, and the electroplating is on the at least one non-line-of-sight-surfaces. 
     
     
         12 . The method of  claim 1 , wherein the liquid is free from water. 
     
     
         13 . The method of  claim 1 , wherein the solvent is selected from the group of an ionic liquid and a deep eutectic solvent. 
     
     
         14 . The method of  claim 13 , wherein the solvent is a deep eutectic solvent, and includes at least one of choline chloride with urea, ethylene glycol, glycerol, and malonic acid. 
     
     
         15 . A solution for electroplating, comprising:
 a mixture of metallic salts of one or more refractory metal elements and a solvent, wherein the mixture has a eutectic point below about 100° C.   
     
     
         16 . The solution of  claim 15 , wherein the eutectic point is between about 10° C. and 100° C. 
     
     
         17 . The solution of  claim 15 , wherein the refractory metal elements include at least one of zirconium, niobium, titanium, tantalum, molybdenum, tungsten, rhenium, and hafnium, and combinations thereof. 
     
     
         18 . The solution of  claim 15 , wherein the refractory metal elements include at least one metal selected from the group of zirconium, niobium, titanium, tantalum, molybdenum, tungsten, rhenium, and hafnium. 
     
     
         19 . The solution of  claim 15 , wherein the mixture is free from water. 
     
     
         20 . The solution of  claim 15 , wherein the solvent is selected from the group of an ionic liquid and a deep eutectic solvent.

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