Method and system for optimizing optical inspection of patterned structures

Abstract

A system for use in inspection of patterned structures, including a data input utility for receiving first type of data indicative of image data on at least a part of the patterned structure, and a data processing and analyzing utility configured and operable for analyzing the image data, and determining a geometrical model for at least one feature of a pattern in said structure, and using said geometrical model for determining an optical model for second type of data indicative of optical measurements on a patterned structure.

What is claimed is: 
     
         1 . A system for use in inspection of patterned structures, the system comprising:
 a data input utility for receiving first type of data indicative of image data on at least a part of the patterned structure; and   a data processing and analyzing utility configured and operable for analyzing the image data, and determining a geometrical model for at least one feature of a pattern in said structure, and using said geometrical model for determining an optical model for second type of data indicative of optical measurements on a patterned structure.   
     
     
         2 . A method for use in inspection of patterned structures, the method comprising:
 receiving first type of data indicative of image data on at least a part of the patterned structure;   processing and analyzing data indicative of the image data and determining a geometrical model for at least one feature of a pattern in said structure; and   using said geometrical model for determining an optical model for second type of data indicative of optical measurements on a patterned structure.   
     
     
         3 . A method for use in inspection of patterned structures, the method comprising:
 receiving image data indicative of one or more images of at least a part of the patterned structure obtained by a scanning tool;   processing and analyzing data indicative of said image data and determining a geometrical model for at least one feature of a pattern in said structure; and   using said geometrical model for determining an optical model for scatterometry based optical measurements on a patterned structure, thereby enabling use of said geometrical model for interpreting scatterometry based measurements applied to the patterned structure progressing on a production line.