Device for controlling additive manufacturing machinery

Abstract

A computing device for controlling the operation of an additive manufacturing machine comprises a memory element and a processing element. The memory element is configured to store a three-dimensional model of a part to be manufactured, wherein the three-dimensional model defines a plurality of cross sections of the part. The processing element is in communication with the memory element. The processing element is configured to receive the three-dimensional model, determine a plurality of paths, each path including a plurality of parallel lines, determine a radiation beam power for each line, such that the radiation beam power varies non-linearly according to a length of the line, and determine a radiation beam scan speed for each line, such that the radiation beam scan speed is a function of a temperature of a material used to manufacture the part, the length of the line, and the radiation beam power for the line.

1 . A computing device for controlling the operation of an additive manufacturing machine, the computing device comprising:
 a memory element configured to store a three-dimensional model of a part to be manufactured, the three-dimensional model defining a plurality of cross sections of the part; and   a processing element in electronic communication with the memory element, the processing element configured to receive the three-dimensional model,
 determine a plurality of paths, one path across a surface of each cross section, each path including a plurality of parallel lines, 
 receive an ambient processing temperature for a material used to manufacture the part, 
 determine a material processing temperature for each point along each line of each path, 
 determine an energy balance for each point along each line of each path necessary to maintain the material processing temperature, and 
 determine a plurality of process settings to control scanning of a radiation beam along the path of each cross section. 
   
     
     
         2 . The computing device of  claim 1 , wherein determining the process settings comprises determining a plurality of radiation beam powers, one radiation beam power for each line of each path, such that the radiation beam power varies from line to line non-linearly according to a length of the line. 
     
     
         3 . The computing device of  claim 2 , wherein the radiation beam power to scan one line determined by the processing element is constant for the entire length of the line. 
     
     
         4 . The computing device of  claim 1 , wherein determining the process settings comprises determining a plurality of radiation beam scan speeds, one radiation beam scan speed for each line of each path, such that the radiation beam scan speed is a function of the material processing temperature, the length of the line, and a radiation beam power for the line. 
     
     
         5 . The computing device of  claim 4 , wherein the radiation beam scan speed to scan one line determined by the processing element is constant for the entire length of the line. 
     
     
         6 . The computing device of  claim 1 , wherein the material processing temperature is a temperature of the material for each point as the radiation beam strikes the point. 
     
     
         7 . The computing device of  claim 1 , wherein the material processing temperature is a maximum temperature of the material for each point. 
     
     
         8 . The computing device of  claim 1 , wherein the material processing temperature is a temperature of the material for each point at a time period after the material reaches a maximum temperature. 
     
     
         9 . The computing device of  claim 1 , wherein the energy balance includes a relationship between energy required from the radiation beam to maintain the material processing temperature and a loss of energy in the material. 
     
     
         10 . The computing device of  claim 1 , wherein the processing element is further configured to generate electronic signals and/or data for a radiation beam power source and radiation beam deflector circuitry such that levels and/or values of the electronic signals and/or data vary according to the process settings. 
     
     
         11 . An electron beam melt machine comprising:
 an electron beam generator configured to generate an electron beam utilized to melt and fuse raw material to manufacture a part; and   a computing device for controlling the operation of the electron beam melt machine, the computing device comprising
 a memory element configured to store a three-dimensional model of the part, the three-dimensional model defining a plurality of cross sections of the part, and 
 a processing element in electronic communication with the memory element, the processing element configured to receive the three-dimensional model,
 determine a plurality of paths, one path across a surface of each cross section, each path including a plurality of parallel lines, 
 receive an ambient processing temperature for a material used to manufacture the part, 
 determine a material processing temperature for each point along each line of each path, 
 determine an energy balance for each point along each line of each path necessary to maintain the material processing temperature, and 
 determine a plurality of process settings to control scanning of an electron beam along the path of each cross section. 
 
   
     
     
         12 . The electron beam melt machine of  claim 11 , wherein determining the process settings comprises determining a plurality of electron beam powers, one electron beam power for each line of each path, such that the electron beam power varies from line to line non-linearly according to a length of the line but is constant for the entire length of each line. 
     
     
         13 . The electron beam melt machine of  claim 11 , wherein determining the process settings comprises determining a plurality of electron beam scan speeds, one electron beam scan speed for each line of each path, such that the electron beam scan speed is a function of the material processing temperature, the length of the line, and an electron beam power for the line and is constant for the entire length of each line. 
     
     
         14 . The electron beam melt machine of  claim 11 , wherein the energy balance includes a relationship between energy required from the electron beam to maintain the material processing temperature and a loss of energy in the material. 
     
     
         15 . The computing device of  claim 11 , wherein the material processing temperature is a temperature of the material for each point as the radiation beam strikes the point. 
     
     
         16 . A method for controlling the operation of an electron beam melt machine, the method comprising the steps of:
 receiving the three-dimensional model,   determining a plurality of paths, one path across a surface of each cross section, each path including a plurality of parallel lines,   receiving an ambient processing temperature for a material used to manufacture the part,   determining a material processing temperature for each point along each line of each path,   determining an energy balance for each point along each line of each path necessary to maintain the material processing temperature, and   determining a plurality of process settings to control scanning of an electron beam along the path of each cross section.   
     
     
         17 . The method of  claim 16 , wherein determining the process settings comprises determining a plurality of electron beam powers, one electron beam power for each line of each path, such that the electron beam power varies from line to line non-linearly according to a length of the line but is constant for the entire length of each line. 
     
     
         18 . The method of  claim 16 , wherein determining the process settings comprises determining a plurality of electron beam scan speeds, one electron beam scan speed for each line of each path, such that the electron beam scan speed is a function of the material processing temperature, the length of the line, and an electron beam power for the line and is constant for the entire length of each line. 
     
     
         19 . The method of  claim 16 , wherein the energy balance includes a relationship between energy required from the electron beam to maintain the material processing temperature and a loss of energy in the material. 
     
     
         20 . The method of  claim 16 , further comprising generating electronic signals and/or data for an electron beam power source and electron beam deflector circuitry such that levels and/or values of the electronic signals and/or data vary according to the process settings.