Monolithic high refractive index photonic devices

Abstract

Fabricating a high refractive index photonic device includes disposing a polymerizable composition on a first surface of a first substrate and contacting the polymerizable composition with a first surface of a second substrate, thereby spreading the polymerizable composition on the first surface of the first substrate. The polymerizable composition is cured to yield a polymeric structure having a first surface in contact with the first surface of the first substrate, a second surface opposite the first surface of the polymeric structure and in contact with the first surface of the second substrate, and a selected residual layer thickness between the first surface of the polymeric structure and the second surface of the polymeric structure in the range of 10 μm to 1 cm. The polymeric structure is separated from the first substrate and the second substrate to yield a monolithic photonic device having a refractive index of at least 1.6.

1 . (canceled) 
     
     
         2 . A photonic device comprising:
 a monolithic structure comprising a patterned surface defining protrusions and recessions, wherein the monolithic structure is composed of a cured polymeric material, a refractive index of the monolithic structure is at least 1.6, and a minimum thickness of the monolithic structure is in a range of 10 μm to 1 cm.   
     
     
         3 . The photonic device of  claim 2 , wherein a dimension of each protrusion and recession is less than 10 nm, less than 100 nm, less than 1 μm, less than 10 μm, less than 100 μm, or less than 1 mm. 
     
     
         4 . The photonic device of  claim 2 , wherein the cured polymeric material comprises a thiol-ene based polymer. 
     
     
         5 . The photonic device of  claim 4 , wherein the cured polymeric material comprises a metal oxide. 
     
     
         6 . The photonic device of  claim 5 , wherein the cured polymeric material comprises 0.1 wt % to 30 wt % of the metal oxide. 
     
     
         7 . The photonic device of  claim 6 , wherein the metal oxide comprises titanium dioxide, zirconium dioxide, zinc oxide, or a combination thereof. 
     
     
         8 . The photonic device of  claim 2 , wherein the refractive index of the monolithic photonic device is in a range of 1.7-1.9. 
     
     
         9 . The photonic device of  claim 8 , wherein the refractive index of the monolithic photonic device is in a range of 1.6-1.9. 
     
     
         10 . The photonic device of  claim 2 , wherein the refractive index of the monolithic photonic device is at least 1.65. 
     
     
         11 . The photonic device of  claim 10 , wherein the refractive index of the monolithic photonic device is at least 1.7. 
     
     
         12 . The photonic device of  claim 2 , wherein the field of view of the photonic device (4:3 aspect ratio) is up to 50°. 
     
     
         13 . The photonic device of  claim 2 , wherein the photonic device is optically transparent. 
     
     
         14 . The photonic device of  claim 2 , wherein the photonic device is a lens. 
     
     
         15 . The photonic device of  claim 2 , wherein a transmittance of the monolithic structure is greater than 80% between 400 nm and 800 nm. 
     
     
         16 . The photonic device of  claim 2 , wherein the patterned surface is a first patterned surface, and the monolithic structure further comprises a second patterned surface opposite the first patterned surface.