US2020411307A1PendingUtilityA1

Substrate treating liquid

59
Assignee: SCREEN HOLDINGS CO LTDPriority: Jun 28, 2019Filed: Jun 24, 2020Published: Dec 31, 2020
Est. expiryJun 28, 2039(~12.9 yrs left)· nominal 20-yr term from priority
Inventors:Yuta Sasaki
H10P 70/20H10P 72/0408C11D 7/3209C11D 7/32C11D 3/43C07C 251/32C11D 7/50C11D 7/3218G03F 7/40C07C 251/44H01L 21/6715H01L 21/02057H10P 70/15C11D 2111/18
59
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Claims

Abstract

The substrate treating liquid according to the present invention can be used for removing a liquid on a substrate such as a semiconductor substrate having a pattern-formed surface, and is characterized by including cyclohexanone oxime as a sublimable substance, and at least one solvent selected from the group consisting of alcohols, ketones, ethers, cycloalkanes and water.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A substrate treating liquid which is used for removing a liquid on a substrate having a pattern-formed surface, comprising:
 cyclohexanone oxime as a sublimable substance, and   at least one solvent selected from the group consisting of alcohols, ketones, ethers, cycloalkanes and water.   
     
     
         2 . The substrate treating liquid according to  claim 1 , wherein the content of the cyclohexanone oxime is in a range of 0.1% by volume or more and 10% by volume or less based on the total volume of the substrate treating liquid. 
     
     
         3 . The substrate treating liquid according to  claim 1 , wherein the solvent is at least one selected from the group consisting of methyl alcohol, ethyl alcohol, isopropyl alcohol, n-butyl alcohol, tert-butyl alcohol, cyclohexanol, acetone, propylene glycol monoethyl ether, propylene glycol monomethyl ether acetate, cyclohexane and water. 
     
     
         4 . The substrate treating liquid according to  claim 1 , wherein the cyclohexanone oxime is present in a state of being dissolved in the solvent, or the cyclohexanone oxime is present in the solvent in a molten state.

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