US2020306933A1PendingUtilityA1

Polishing sheet and polishing method

Assignee: 3M INNOVATIVE PROPERTIES COPriority: Jan 5, 2018Filed: Jan 2, 2019Published: Oct 1, 2020
Est. expiryJan 5, 2038(~11.5 yrs left)· nominal 20-yr term from priority
B24D 2203/00B24D 11/02B24D 3/002
48
PatentIndex Score
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Claims

Abstract

Object: To provide a polishing sheet capable of efficiently polishing a hard material such as a metal product so as to form a smooth surface with minimal unevenness. Solution: A polishing sheet (10) including: a substrate (11); a plurality of three-dimensional elements (12) containing abrasive grains and a binding material; and an intermediate layer (13) provided between the three-dimensional elements (12) and the substrate (11) so as to join the substrate (11) and the three-dimensional elements (12), wherein a Youngs modulus of the substrate (11) at 25° C. is not less than 3.0×109Pa; and a Youngs modulus of the intermediate layer (13) at 25° C. is not less than 1.0×107Pa and not greater than 5.0×108Pa.

Claims

exact text as granted — not AI-modified
1 . A polishing sheet comprising:
 a substrate;   a plurality of three-dimensional elements containing abrasive grains and a binding material; and   an intermediate layer provided between the three-dimensional elements and the substrate so as to join the substrate and the three-dimensional elements,   wherein a Young's modulus of the substrate at 25° C. is not less than 3.0×10 9  Pa; and   a Young's modulus of the intermediate layer at 25° C. is not less than 1.0×10′ Pa and not greater than 5.0×10 8  Pa.   
     
     
         2 . The polishing sheet according to  claim 1 , wherein a Young's modulus of the binding material at 25° C. is not less than 1.0×10 9  Pa. 
     
     
         3 . The polishing sheet according to  claim 1 , wherein the binding material contains: a resin composition containing an acrylic monomer; and
 not less than 60 mass % of the acrylic monomer is a polyfunctional monomer selected from the group consisting of tris(2-hydroxyethyl)isocyanurate triacrylate and tris(2-hydroxyethyl)isocyanurate diacrylate.   
     
     
         4 . The polishing sheet according to  claim 1 , wherein a breaking elongation of the substrate is not greater than 200%. 
     
     
         5 . The polishing sheet according to  claim 1 , wherein the substrate contains at least one selected from the group consisting of resin films and metal films. 
     
     
         6 . The polishing sheet according to  claim 1 , wherein the intermediate layer contains a cured product of a resin composition containing a urethane acrylate. 
     
     
         7 . The polishing sheet according to  claim 1 , wherein the binding material contains a phenol resin. 
     
     
         8 . A polishing sheet comprising:
 a substrate;   a plurality of three-dimensional elements containing abrasive grains and a binding material; and   an intermediate layer provided between the three-dimensional elements and the substrate so as to join the substrate and the three-dimensional elements,   wherein the binding material contains a cured product of a resin composition containing an acrylic monomer; and   not less than 60 mass % of the acrylic monomer is a polyfunctional monomer selected from the group consisting of tris(2-hydroxyethyl)isocyanurate triacrylate and tris(2-hydroxyethyl)isocyanurate diacrylate.   
     
     
         9 . A polishing method using the polishing sheet according to  claim 1 , the method comprising sliding the polishing sheet and an object to be polished while pressing the polishing sheet against the object to be polished under a load of not less than 1.0×10 6  Pa. 
     
     
         10 . A polishing method using the polishing sheet according to  claim 8 , the method comprising sliding the polishing sheet and an object to be polished while pressing the polishing sheet against the object to be polished under a load of not less than 1.0×10 6  Pa.

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