Deposition platform for flexible substrates and method of operation thereof
Abstract
An apparatus for processing a flexible substrate is provided including a vacuum chamber having a first chamber portion, second chamber portion and third chamber portion. The apparatus further includes an unwinding shaft supporting the flexible substrate to be processed and a winding shaft supporting the flexible substrate after processing, wherein the unwinding shaft and the winding shaft are disposed in the first chamber portion, a first wall separating the first chamber portion from the second chamber portion, wherein the first wall is inclined with respect to a vertical and horizontal orientation, a coating drum having a first portion disposed in the second chamber portion and a second portion disposed in the third chamber portion, and a plurality of processing stations disposed at least partially in the third chamber portion, wherein a majority of the plurality of the processing stations are disposed below a rotational axis of the coating drum.
Claims
exact text as granted — not AI-modified1 . An apparatus for processing a flexible substrate, comprising:
a vacuum chamber having a first chamber portion, a second chamber portion and a third chamber portion; an unwinding shaft for supporting the flexible substrate to be processed and a winding shaft for supporting the flexible substrate after processing, wherein the unwinding shaft and the winding shaft are disposed in the first chamber portion; a first wall separating the first chamber portion from the second chamber portion, wherein the first wall is inclined with respect to a vertical and horizontal orientation; a coating drum having a first portion disposed in the second chamber portion and a second portion disposed in the third chamber portion, the coating drum having a rotational axis; and a plurality of processing stations disposed at least partially in the third chamber portion, wherein a majority of the plurality of the processing stations are disposed below the rotational axis of the coating drum.
2 . The apparatus of claim 1 , wherein the first wall is inclined at an angle of at least 20 degrees with respect to a vertical orientation.
3 . The apparatus of claim 1 , wherein the first wall is inclined between about 20° and about 70° with respect to a vertical orientation.
4 . The apparatus of claim 1 , wherein the rotational axis of the coating drum is disposed below a rotational axis of the unwinding shaft and a rotational axis of the winding shaft.
5 . The apparatus of claim 1 , wherein
each processing station comprises a deposition source, and each processing station is disposed at a vertical location of the rotational axis of the coating drum or below the rotational axis of the coating drum.
6 . The apparatus of claim 1 , further comprising a first gap sluice separating the first chamber portion from the second chamber portion, wherein the first gap sluice is configured to close on the flexible substrate to provide a vacuum seal between the first chamber portion and the second chamber portion.
7 . The apparatus of claim 1 , further comprising a second wall separating the second chamber portion from the third chamber portion, wherein the second wall is inclined with respect to a vertical and horizontal orientation.
8 . The apparatus of claim 7 , wherein the second wall is inclined between about 20° and about 70° with respect to a vertical orientation.
9 . The apparatus of claim 7 , wherein the second wall is parallel to the first wall.
10 . The apparatus of claim 1 , wherein a majority of the second portion of the coating drum is located below the rotational axis of the coating drum.
11 . The apparatus of claim 10 , wherein at least some of the second portion of the coating drum is located above the rotational axis of the coating drum.
12 . An apparatus for processing a flexible substrate, comprising:
a vacuum chamber having a first chamber portion, a second chamber portion and a third chamber portion; an unwinding shaft and a winding shaft both disposed in the first chamber portion; a first wall separating the first chamber portion from the second chamber portion, wherein the first wall is inclined with respect to a vertical and horizontal orientation; a coating drum having a first portion disposed in the second chamber portion and a second portion disposed in the third chamber portion, the coating drum having a rotational axis; and a plurality of processing stations disposed at least partially in the third chamber portion.
13 . The apparatus of claim 12 , wherein the first wall is inclined at an angle of at least 20 degrees with respect to a vertical orientation.
14 . The apparatus of claim 12 , wherein a majority of the plurality of the processing stations are disposed below the rotational axis of the coating drum.
15 . An apparatus for processing a flexible substrate, comprising:
a vacuum chamber having a first chamber portion, a second chamber portion and a third chamber portion; an unwinding shaft for supporting the flexible substrate to be processed and a winding shaft for supporting the flexible substrate after processing, wherein the unwinding shaft and the winding shaft are disposed in the first chamber portion; a first wall separating the first chamber portion from the second chamber portion, wherein the first wall is inclined with respect to a vertical and horizontal orientation, wherein the first wall is inclined by at least 20 degrees with respect to the vertical orientation; a first gap sluice separating the first chamber portion from the second chamber portion at a first position on the first wall, the first gap sluice configured to open and close to provide a first vacuum seal between the first chamber portion and the second chamber portion at the first position; a second gap sluice separating the first chamber portion from the second chamber portion at a second position on the first wall, the second gap sluice configured to open and close to provide a second vacuum seal between the first chamber portion and the second chamber portion at the second position, wherein the first position is spaced apart from the second position in a vertical and horizontal direction; a coating drum disposed in the second chamber portion and the third chamber portion, the coating drum having a rotational axis; and a plurality of processing stations disposed at least partially in the third chamber portion, wherein a majority of the plurality of the processing stations are disposed below the rotational axis of the coating drum.
16 . The apparatus of claim 15 , wherein the first wall is inclined between about 20° and about 70° with respect to a vertical orientation.
17 . The apparatus of claim 15 , wherein each processing station is disposed at a vertical location of the rotational axis of the coating drum or below the rotational axis of the coating drum.Join the waitlist — get patent alerts
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