US2020294848A1PendingUtilityA1

Semiconductor device and method of manufacturing the same

Assignee: SEMICONDUCTOR ENERGY LABPriority: Oct 30, 2001Filed: Mar 27, 2020Published: Sep 17, 2020
Est. expiryOct 30, 2021(expired)· nominal 20-yr term from priority
H10P 50/691H10W 10/181H10W 10/061H10P 90/1914H10K 71/421H10D 86/40H10D 86/411H10D 86/0214H10D 86/60H10D 30/6758H10D 86/00H01L 27/1218H01L 21/76251H01L 27/32H01L 21/308H01L 27/1266H01L 21/76275H01L 51/0024H01L 27/1214H01L 29/78603H01L 51/56H10K 71/50H10K 77/111
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Claims

Abstract

A semiconductor device having a semiconductor element (a thin film transistor, a thin film diode, a photoelectric conversion element of silicon PIN junction, or a silicon resistor element) which is light-weight, flexible (bendable), and thin as a whole is provided as well as a method of manufacturing the semiconductor device. In the present invention, the element is not formed on a plastic film. Instead, a flat board such as a substrate is used as a form, the space between the substrate (third substrate (17)) and a layer including the element (peeled layer (13)) is filled with coagulant (typically an adhesive) that serves as a second bonding member (16), and the substrate used as a form (third substrate (17)) is peeled off after the adhesive is coagulated to hold the layer including the element (peeled layer (13)) by the coagulated adhesive (second bonding member (16)) alone. In this way, the present invention achieves thinning of the film and reduction in weight.

Claims

exact text as granted — not AI-modified
1 . (canceled) 
     
     
         2 . A method of manufacturing a semiconductor device, comprising the steps of:
 forming a separation layer comprising silicon over a glass substrate;   forming a layer over the separation layer, the layer including a semiconductor element; and   scanning the separation layer with a laser light through the glass substrate thereby separating the glass substrate from the layer.   
     
     
         3 . The method according to  claim 2 , wherein the layer further includes an insulating layer under the semiconductor element. 
     
     
         4 . The method according to  claim 2 , wherein the separation layer comprises one of amorphous silicon and polysilicon. 
     
     
         5 . The method according to  claim 2 , further comprising the step of:
 bonding a supporting member over the layer using a first adhesive layer before separating the glass substrate.   
     
     
         6 . The method according to  claim 2 , further comprising the steps of:
 bonding a flexible substrate under the layer using a second adhesive layer after separating the glass substrate.   
     
     
         7 . The method according to  claim 6 , further comprising the step of:
 pasting the flexible substrate with the layer on a curved surface.   
     
     
         8 . The method according to  claim 6 , wherein the flexible substrate comprises at least one of polyethyleneterephthalate, polyethersulfone, polyethylene naphthalate, polycarbonate, nylon, polyetheretherketone, polysulfone, polyetherimide, polyarylate, polybutylene terephthalate, and polyimide. 
     
     
         9 . The method according to  claim 5 , wherein the first adhesive layer comprises at least one of reaction-cured adhesives, thermally-curable adhesives, photo-curable adhesives, and anaerobic adhesives. 
     
     
         10 . A method of manufacturing a semiconductor device, comprising the steps of:
 forming a separation layer comprising silicon over a glass substrate;   forming a layer over the separation layer, the layer including a semiconductor element and an light emitting element; and   scanning the separation layer with a laser light through the glass substrate thereby separating the glass substrate from the layer.   
     
     
         11 . The method according to  claim 10 , wherein the layer further includes an insulating layer under the semiconductor element. 
     
     
         12 . The method according to  claim 10 , wherein the separation layer comprises one of amorphous silicon and polysilicon. 
     
     
         13 . The method according to  claim 10 , further comprising the step of:
 bonding a supporting member over the layer using a first adhesive layer before separating the glass substrate.   
     
     
         14 . The method according to  claim 10 , further comprising the steps of:
 bonding a flexible substrate under the layer using a second adhesive layer after separating the glass substrate.   
     
     
         15 . The method according to  claim 14 , further comprising the step of:
 pasting the flexible substrate with the layer on a curved surface.   
     
     
         16 . The method according to  claim 14 , wherein the flexible substrate comprises at least one of polyethyleneterephthalate, polyethersulfone, polyethylene naphthalate, polycarbonate, nylon, polyetheretherketone, polysulfone, polyetherimide, polyarylate, polybutylene terephthalate, and polyimide. 
     
     
         17 . The method according to  claim 13 , wherein the first adhesive layer comprises at least one of reaction-cured adhesives, thermally-curable adhesives, photo-curable adhesives, and anaerobic adhesives.

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