Thin film forming apparatus and transparent conductive film

Abstract

A thin film forming apparatus including: a first chamber configured to generate a mist of a dispersion liquid, and including an outlet; a second chamber configured to receive the generated mist from the first chamber and collect particles of the generated mist having a size greater than a predetermined value, and including an inlet provided on a top of the second chamber and connected to the outlet of the first chamber, and an outlet provided on the top of the second chamber and configured to transfer, as homogenized mist, particles of the generated mist having a size less than or equal to the predetermined value due to the effect of gravity on the particles of the mist; and a third chamber configured to receive the homogenized mist from the second chamber, and including an inlet connected to the outlet of the second chamber.

What is claimed is: 
     
         1 . A method of manufacturing a thin film, comprising:
 generating mist of a dispersion liquid containing fine particles;   supplying the generated mist of the dispersion liquid onto a substrate; and   drying the dispersion liquid supplied onto the substrate.   
     
     
         2 . A method of manufacturing a thin film according to  claim 1 , wherein the fine particles contained in the generated mist of the dispersion liquid each have a particle size of 100 nm or less. 
     
     
         3 . A method of manufacturing a thin film according to  claim 1 , wherein the substrate comprises a resin and has flexibility. 
     
     
         4 . A method of manufacturing a thin film according to  claim 1 , wherein the drying the dispersion liquid is performed at a temperature that is lower than a softening point of the substrate. 
     
     
         5 . A method of manufacturing a thin film according to  claim 4 , wherein the drying the dispersion liquid is performed at a temperature of 10° C. or higher and 40° C. or lower. 
     
     
         6 . A method of manufacturing a thin film according to  claim 1 , further comprising:
 forming, on the substrate, a hydrophilic/water-repellent pattern comprising a hydrophilic portion and a water-repellent portion,   wherein the supplying the generated mist is performed to the substrate having the hydrophilic/water-repellent pattern formed thereon in the forming a hydrophilic/water-repellent pattern.   
     
     
         7 . A method of manufacturing a thin film according to  claim 1 , further comprising, after the drying the dispersion liquid, radiating an ultraviolet ray to the substrate,
 wherein the supplying the generated mist is performed again to the substrate to which the ultraviolet ray is radiated in the radiating an ultraviolet ray.   
     
     
         8 . A method of manufacturing a thin film according to  claim 7 , wherein, in the supplying the generated mist, the fine particles contained in the mist that is supplied before the radiating an ultraviolet ray and the fine particles contained in the mist that is supplied after the radiating an ultraviolet ray are different. 
     
     
         9 . A method of manufacturing a thin film according to  claim 7 , wherein the ultraviolet ray radiated in the radiating an ultraviolet ray at least has a wavelength of 200 nm or less. 
     
     
         10 . A method of manufacturing a thin film according to  claim 1 , wherein, in the supplying the generated mist, the substrate is tilted from a horizontal plane. 
     
     
         11 . A method of manufacturing a thin film according to  claim 1 , wherein, in the supplying the generated mist, the substrate is tilted from a plane orthogonal to a direction of the supply. 
     
     
         12 . A method of manufacturing a thin film according to  claim 1 , wherein the fine particles comprise metal oxide fine particles comprising any one of indium, zinc, tin, and titanium. 
     
     
         13 . A transparent conductive film, which is manufactured by the method of manufacturing a thin film of  claim 12 .