Gap fill of imprinted structure with spin coated high refractive index material for optical components

Abstract

Embodiments of the present disclosure generally relate to a method for forming an optical component, for example, for a virtual reality or augmented reality display device. In one embodiment, the method includes forming a first layer on a substrate, and the first layer has a first refractive index. The method further includes pressing a stamp having a pattern onto the first layer, and the pattern of the stamp is transferred to the first layer to form a patterned first layer. The method further includes forming a second layer on the patterned first layer by spin coating, and the second layer has a second refractive index greater than the first refractive index. The second layer having the high refractive index is formed by spin coating, leading to improved nanoparticle uniformity in the second layer.

What is claimed is: 
     
         1 . A method, comprising:
 forming a first layer having a first refractive index on a substrate;   pressing a stamp having a pattern onto the first layer;   transferring the pattern to the first layer to form a patterned first layer, wherein the patterned first layer comprises a continuous first layer; and   forming a second layer having a second refractive index greater than the first refractive index on the patterned first layer by spin coating, the second layer comprising a continuous second layer.   
     
     
         2 . The method of  claim 1 , wherein the first refractive index ranges from about 1.1 to about 1.5. 
     
     
         3 . The method of  claim 1 , wherein the first layer comprises porous silicon dioxide or quartz. 
     
     
         4 . The method of  claim 1 , wherein the second layer comprises a metal oxide. 
     
     
         5 . The method of  claim 1 , wherein the second layer comprises titanium oxide, tantalum oxide, zirconium oxide, hafnium oxide, or niobium oxide. 
     
     
         6 . The method of  claim 1 , wherein the first layer is formed on the substrate by spin coating. 
     
     
         7 . A method, comprising:
 forming a first layer having a first refractive index ranging from about 1.1 to about 1.5;   pressing a stamp having a pattern onto the first layer;   transferring the pattern to the first layer to form a patterned first layer, wherein the patterned first layer comprises a continuous first layer; and   forming a second layer having a second refractive index ranging from about 1.7 to about 2.4 on the patterned first layer by spin coating, the second layer comprising a continuous second layer.   
     
     
         8 . The method of  claim 7 , wherein the first layer comprises porous silicon dioxide or quartz. 
     
     
         9 . The method of  claim 7 , wherein the second layer comprises a metal oxide. 
     
     
         10 . The method of  claim 7 , wherein the second layer comprises titanium oxide, tantalum oxide, zirconium oxide, hafnium oxide, or niobium oxide. 
     
     
         11 . The method of  claim 7 , wherein transferring the pattern to the first layer comprises curing the first layer with the stamp on the first layer. 
     
     
         12 . The method of  claim 11 , wherein the curing the first layer comprises UV curing or thermal curing. 
     
     
         13 . The method of  claim 12 , further comprising curing the second layer. 
     
     
         14 . A method, comprising:
 forming a first layer having a first refractive index on a first surface of a substrate;   pressing a first stamp having a first pattern onto the first layer;   transferring the first pattern to the first layer to form a patterned first layer, wherein the patterned first layer comprises a continuous first layer; and   forming a second layer having a second refractive index ranging from about 1.7 to about 2.4 on the patterned first layer by spin coating, the second layer comprising a metal oxide and the second layer comprising a continuous second layer.   
     
     
         15 . The method of  claim 14 , wherein the first refractive index ranges from about 1.1 to about 1.5. 
     
     
         16 . The method of  claim 14 , wherein the first layer comprises porous silicon dioxide or quartz. 
     
     
         17 . The method of  claim 14 , wherein the second layer comprises titanium oxide, tantalum oxide, zirconium oxide, hafnium oxide, or niobium oxide. 
     
     
         18 . The method of  claim 14 , wherein the first layer is formed on the first surface of the substrate by spin coating. 
     
     
         19 . The method of  claim 14 , wherein transferring the first pattern to the first layer further comprises curing the first layer with the first stamp on the first layer. 
     
     
         20 . The method of  claim 19 , wherein the curing the first layer comprises UV curing or thermal curing.