Regulation plate, plating apparatus equipped with the same, and plating method

Abstract

The present invention provides a regulation plate and a plating apparatus equipped with the regulation plate which can curb reduction in in-plane uniformity due to influence of a terminal effect with respect to plural substrates differing in characteristics and processing conditions. One form of the present invention provides a regulation plate used to adjust an electric current between an anode and a substrate to be plated. The regulation plate includes a plate main body provided with an opening adapted to allow passage of an electric current; plural first blades used to narrow a diameter of the opening; and a first moving mechanism adapted to translate the plural first blades in a radial direction of the opening.

1 . A regulation plate used to adjust an electric current between an anode and a substrate to be plated, comprising:
 a plate main body provided with a rim forming a first opening adapted to allow passage of an electric current;   plural first blades used to narrow a diameter of the first opening; and   a first moving mechanism adapted to translate the plural first blades in a radial direction of the first opening.   
     
     
         2 . The regulation plate according to  claim 1 , wherein:
 the first moving mechanism includes a ring member placed along the rim;   either of the ring member and the plural first blades includes a slide slot inclined in the radial direction of the first opening; and   another of the ring member and the plural first blades includes a slide pin adapted to slide along the slide slot.   
     
     
         3 . The regulation plate according to  claim 2 , wherein:
 the first moving mechanism includes a blade presser member fixed on a side opposite the ring member of the plural first blades;   either of the blade presser member and the plural first blades includes a guide slot formed in parallel to a translation direction of the first blades; and   another of the blade presser member and the plural first blades includes a guide pin adapted to slide along the guide slot.   
     
     
         4 . The regulation plate according to  claim 2 , wherein:
 the first moving mechanism includes a rotating member used to rotate the ring member in a circumferential direction; and   the rotating member includes a ring portion fixed to the ring member, and a lever portion adapted to rotate the ring portion in the circumferential direction.   
     
     
         5 . The regulation plate according to  claim 4 , wherein:
 either of the plate main body and the ring member includes a support slot formed along a rotation direction of the ring member; and   another of the plate main body and the ring member includes a support pin slidably engaged with the support slot.   
     
     
         6 . The regulation plate according to  claim 1 , wherein an inner peripheral edge of each of the plural first blades is formed into an arc shape and is overlapped with other first blades, forming a substantially circular inner peripheral edge. 
     
     
         7 . The regulation plate according to  claim 1 , further comprising:
 plural second blades placed at a position shifted from the plural first blades in a direction orthogonal to the radial direction of the first opening and used to narrow the diameter of the first opening; and   a second moving mechanism adapted to translate the plural second blades in the radial direction of the first opening.   
     
     
         8 . The regulation plate according to  claim 7 , wherein the plural first blades and the plural second blades are arranged such that a straight line joining a center of an opening formed by the first blades and a center of an opening formed by the second blades is orthogonal to the radial direction of the openings. 
     
     
         9 . A regulation plate used to adjust an electric current between an anode and a substrate to be plated, comprising:
 a first plate main body provided with a first rim forming a first opening adapted to allow   passage of an electric current and plural first blades used to narrow a diameter of the first opening; and   a second plate main body provided with a second rim forming a second opening adapted to allow passage of an electric current and plural second blades used to narrow a diameter of the second opening, wherein   the first plate main body and the second plate main body are coupled together such that a straight line joining a center of an opening formed by the plural first blades and a center of an opening formed by the plural second blades is orthogonal to the radial direction of the openings.   
     
     
         10 . The regulation plate according to  claim 7 , wherein the diameter of the opening formed by the plural first blades and the diameter of the opening formed by the plural second blades are configured to be adjustable independently of each other. 
     
     
         11 . A plating apparatus comprises:
 an anode holder configured to hold an anode;   a substrate holder placed opposite the anode holder and configured to hold a substrate;   an anode mask mounted integrally on the anode holder and provided with a second opening adapted to allow passage of an electric current flowing between the anode and the substrate; and   the regulation plates according to  claim 1 , wherein the anode mask includes an adjustment mechanism adapted to adjust a diameter of the second opening.   
     
     
         12 . A plating method comprising:
 placing an anode holder in a plating bath, where the anode holder is integrally provided with an anode mask having a first opening adapted to allow passage of an electric current flowing between an anode and a substrate;   placing a substrate holder adapted to hold a first substrate in the plating bath;   placing a regulation plate between the anode mask and the substrate, where the regulation plate includes a second opening and third opening adapted to allow passage of the electric current flowing between the anode and the substrate;   plating the first substrate by adjusting a diameter of the first opening to a first diameter;   placing a substrate holder adapted to hold a second substrate in the plating bath; and   plating the second substrate by adjusting a diameter of the first opening to a second diameter smaller than the first diameter and by changing the diameters of the second opening and third opening in the regulation plate.