Plasma processing apparatus and heater temperature control method

Abstract

A method is provided for controlling a temperature of a heater arranged in a plasma processing apparatus that converts a gas into plasma using a high frequency power and performs a plasma process on a workpiece with the plasma. The plasma processing apparatus includes a processing chamber that can be depressurized, a mounting table that is arranged within the processing chamber, an electrostatic chuck that is arranged on the mounting table and electrostatically attracts the workpiece, and a heater that is arranged within or near the electrostatic chuck and is divided into a plurality of heater zones. The method includes adjusting a control temperature of the heater with respect to each of the heater zones, and correcting a temperature interference from an adjacent heater zone of each of the heater zones with respect to a setting temperature of each of the heater zones upon adjusting the control temperature.

1 . An apparatus comprising:
 a chamber;   a substrate support disposed in the chamber;   a heater disposed in the substrate support, the heater comprising a plurality of heating zones;   at least one temperature sensor configured to detect a temperature of a first heating zone among the plurality of heating zones; and   a controller configured to adjust the temperature of individual heating zones from among the plurality of heating zones of the heater based on the detected temperature of the first heating zone and a plurality of correction values, each correction value of the plurality of correction values being associated with a corresponding heating zone from among the individual heating zones.   
     
     
         2 . The apparatus of  claim 1 , wherein the plurality of heating zones comprises at least four heating zones. 
     
     
         3 . The apparatus of  claim 2 , wherein the at least one temperature sensor is disposed on the first heating zone. 
     
     
         4 . The apparatus of  claim 3 , further comprising a storage unit for storing the plurality of correction values. 
     
     
         5 . The apparatus of  claim 4 , wherein the storage unit stores a correlation between a preset temperature of each heating zone and an input current value applied to each heating zone,
 wherein the controller is configured to:
 determine the preset temperature of the first heating zone based on the detected temperature; 
 determine the preset temperature of each of the remaining heating zones based on the associated correction value and the detected temperature, and 
 determine the input current value to be applied to each heating zone based on the determined preset temperature of the first heating zone and the stored correlation. 
   
     
     
         6 . The apparatus of  claim 5 , wherein
 the substrate support includes a stage and an electrostatic chuck on the stage,   the heater is disposed in or in the vicinity of the electrostatic chuck; and   each correction value includes a first correction value for correcting deviations in the surface temperature of the electrostatic chuck from the preset temperature of the corresponding heating zone.   
     
     
         7 . The apparatus of  claim 6 , wherein
 each correction value further includes a second correction value for correcting deviations from the preset temperature of the corresponding heating zone due to interference from adjacent heating zones.   
     
     
         8 . The apparatus of  claim 7 , wherein the heating zones are concentrically disposed. 
     
     
         9 . The apparatus of  claim 1 , wherein the controller is configured to:
 determine the preset temperature of the first heating zone based on the detected temperature;   determine the preset temperature of each of the remaining heating zones based on the associated correction value and the detected temperature; and   determine an input current value to be applied to each heating zone based on the determined preset temperature and a correlation between the preset temperature of each heating zone and the input current value to be applied to each heating zone.   
     
     
         10 . The apparatus of  claim 9 , wherein
 the substrate support includes a stage and an electrostatic chuck disposed on the stage;   the heater is disposed in or near the electrostatic chuck; and   each correction value includes a first correction value for correcting deviations in the surface temperature of the electrostatic chuck from the preset temperature of the corresponding heating zone.   
     
     
         11 . The apparatus of  claim 10 , wherein
 each correction value further includes a second correction value for correcting deviations in the preset temperature of the corresponding heating zone due to interference from adjacent heating zones.