Optical system adjustment method of image acquisition apparatus
Abstract
According to one aspect of the present invention, an optical system adjustment method of an image acquisition apparatus includes: extracting one primary electron beam after another from primary electron beams at a plurality of preset positions among multiple primary electron beams; and adjusting, a first detector being capable of individually detecting multiple secondary electrons emitted due to irradiation of a target with the multiple primary electron beams, a trajectory of the one primary electron beam using a primary electron optics while detecting secondary electrons corresponding to the one primary electron beam for each of the primary electron beams extracted one by one using a movable second detector having an inspection surface of a size capable of detecting the multiple secondary electrons as a whole and arranged on an optical path for guiding the multiple secondary electrons to the first detector.
Claims
exact text as granted — not AI-modified1 - 6 . (canceled)
7 : An optical system adjustment method of an image acquisition apparatus comprising:
deflecting one primary electron beam one after another from multiple primary electron beams such that remaining primary electron beams excluding a desired primary electron beam of the multiple primary electron beams become beam OFF using a blanking aperture array mechanism including a substrate including a plurality of passing holes formed by fitting to positions where the multiple primary electron beams pass and a plurality of electrode pairs each arranged in a set of positions facing each other across a corresponding passing hole of the plurality of passing holes; adjusting a trajectory of the desired primary electron beam by a primary electron optics and detecting secondary electrons corresponding to the desired primary electron beam for each of the primary electron beams deflected one after another using a second detector having an inspection surface of a size configured to detect multiple secondary electrons as a whole by performing trajectory deflection of the secondary electrons by a deflector arranged on an optical path for guiding the multiple secondary electrons to a first detector configured to individually detect multiple secondary electron beams emitted due to irradiation of a target with the multiple primary electron beams; and after adjustments of the trajectory of each of the primary electron beams deflected one after another being completed, adjusting the trajectory of the secondary electrons by a secondary electron optics such that the secondary electrons corresponding to the desired primary electron beam are detected in a corresponding region of the first detector for each of the primary electron beams deflected one after another while the trajectory deflection of the secondary electrons by the deflector to the second detector is stopped.
8 : The method according to claim 7 , wherein, a region division type detector is used as the second detector.
9 . (canceled)
10 : An optical system adjustment method of an image acquisition apparatus comprising:
making one primary electron beam pass through one after another from multiple primary electron beams such that remaining primary electron beams excluding a desired primary electron beam of the multiple primary electron beams become beam OFF using a movable shutter including an opening that allows the desired primary electron beam of the multiple primary electron beams to pass through while shielding remaining primary electron beams; adjusting a trajectory of the desired primary electron beam by a primary electron optics and detecting secondary electrons corresponding to the desired primary electron beam for each of the primary electron beams deflected one after another using a second detector having an inspection surface of a size configured to detect multiple secondary electrons as a whole by performing trajectory deflection of the secondary electrons by a deflector arranged on an optical path for guiding the multiple secondary electrons to a first detector configured to individually detect multiple secondary electron beams emitted due to irradiation of a target with the multiple primary electron beams; and after adjustments of the trajectory of each of the primary electron beams deflected one after another being completed, adjusting the trajectory of the secondary electrons by a secondary electron optics such that the secondary electrons corresponding to the desired primary electron beam are detected in a corresponding region of the first detector for each of the primary electron beams deflected one after another while the trajectory deflection of the secondary electrons by the deflector to the second detector is stopped.
11 : The method according to claim 7 , further comprising:
making coarse adjustments of an irradiation position of the desired primary electron beam before the trajectory of the desired primary electron beam is adjusted.
12 : The method according to claim 11 , wherein the coarse adjustments of the irradiation position of the desired primary electron beam are made using a transmission mark which a through hole whose diameter is smaller than an inter-beam pitch of the multiple primary electron beams is formed therein.
13 : The method according to claim 10 , wherein, a region division type detector is used as the second detector.
14 : The method according to claim 10 , further comprising:
making coarse adjustments of an irradiation position of the desired primary electron beam before the trajectory of the desired primary electron beam is adjusted.
15 : The method according to claim 14 , wherein the coarse adjustments of the irradiation position of the desired primary electron beam are made using a transmission mark which a through hole whose diameter is smaller than an inter-beam pitch of the multiple primary electron beams is formed therein.Join the waitlist — get patent alerts
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