Manufacturing method of graphene electrode and liquid crystal display panel

Abstract

Disclosed is a manufacturing method of a graphene electrode, in which a carbon source that is patterned is formed on a metal substrate with photoresist, or as metal layer which is patterned is formed on the carbon source. The metal substrate or metal layer after heating is used to catalyze the carbon source in direct contact therewith into graphene, and thus to form the graphene which is patterned to be used as a graphene electrode which is patterned in a display device. Apparently, the manufacturing method of the graphene electrode according to the present invention can simplify the manufacturing process and can reduce the difficulty of patterning the graphene electrode and the processing cost.

What is claimed is: 
     
         1 . A manufacturing method of a graphene electrode, comprising steps of:
 providing a substrate, and forming a carbon source on the substrate;   forming a photoresist layer on the carbon source;   providing a mask, and exposing the photoresist layer with the mask;   developing the photoresist layer after exposure to form the photoresist layer which is patterned on the carbon source;   forming a metal layer on the substrate, which is covered with the carbon source and the photoresist layer which is patterned in order, and a portion of the metal layer covering on the photoresist layer which is patterned, and the other portion directly covering on the carbon source not covered by the photoresist layer which is patterned;   stripping the photoresist layer which is patterned and the metal layer covering on the photoresist layer which is patterned from the carbon source, and the metal layer directly covering on the carbon source forming the metal layer which is patterned;   heating the metal layer which is patterned under an inactive gas protection to catalyze the carbon source in direct contact with the metal layer which is patterned to form the graphene which is patterned on the substrate;   removing the metal layer which is patterned, and retaining the graphene which is patterned on the substrate to form the graphene electrode which is patterned.   
     
     
         2 . The manufacturing method of the graphene electrode according to  claim 1 , wherein a pattern of the mask is matched with a pattern required for correspondingly manufacturing the graphene electrode; the target substrate is a flexible substrate manufactured by polyethylene terephthalate or polyimide. 
     
     
         3 . The manufacturing method of the graphene electrode according to  claim 1 , wherein the carbon source comprises at least one of: amorphous carbon, polymethylmethacrylate, polycyclic aromatic hydrocarbon, flake graphite powder, C60 and graphite-like; a method of forming the carbon source on the metal substrate covered with the photoresist layer which is patterned comprises at least one of: magnetron sputtering, chemical vapor deposition, direct coating of graphite powder and coating of carbon atoms containing solution. 
     
     
         4 . The manufacturing method of the graphene electrode according to  claim 1 , wherein a method of forming the metal layer on the substrate covered with the photoresist layer which is patterned comprises at least one of: vapor deposition, evaporation and magnetron sputtering coating; a material of the metal layer comprises at least one of: platinum, ruthenium, iridium, copper and nickel.