Variable-illumination fourier ptychographic imaging devices, systems, and methods

Abstract

Certain aspects pertain to Fourier ptychographic imaging systems, devices, and methods such as, for example, high NA Fourier ptychographic imaging systems and reflective-mode NA Fourier ptychographic imaging systems.

1 . An ultra-high NA Fourier ptychographic imaging system, comprising:
 a variable illuminator configured to illuminate a sample at a plurality of incidence angles at different times;   an optical system comprising a lens with a high NA, the lens configured to filter light issuing from the sample, wherein the plurality of incidence angles and the high NA correspond to a plurality of overlapping regions in the Fourier domain that cover an expanded NA of greater than 1.0; and   a radiation detector configured to acquire a plurality of intensity images, each intensity image corresponding to a different incidence angle of the plurality of incidence angles.   
     
     
         2 . The ultra-high NA Fourier ptychographic imaging system of  claim 1 , further comprising a processor configured to generate an image with a higher resolution than a resolution of the intensity images by iteratively updating the overlapping regions in the Fourier domain with intensity image measurements. 
     
     
         3 . The ultra-high NA Fourier ptychographic imaging system of  claim 1 , wherein the lens is configured to filter light from the sample by passing light received within its acceptance angle. 
     
     
         4 . The ultra-high NA Fourier ptychographic imaging system of  claim 1 , wherein the high NA of the filtering optical element is about 0.50. 
     
     
         5 . The ultra-high NA Fourier ptychographic imaging system of  claim 1 , wherein the high NA of the filtering optical element is in a range of about 0.40 to about 0.50. 
     
     
         6 . The ultra-high NA Fourier ptychographic imaging system of  claim 1 , wherein the variable illuminator comprises one or more circular rings of light elements. 
     
     
         7 . The ultra-high NA Fourier ptychographic imaging system of  claim 1 , wherein the variable illuminator comprises a plurality of concentric rings of equally-spaced light elements. 
     
     
         8 . The ultra-high NA Fourier ptychographic imaging system of  claim 7 , wherein each outer ring has a larger number of light elements than an adjacent smaller diameter ring. 
     
     
         9 . The ultra-high NA Fourier ptychographic imaging system of  claim 7 , wherein each concentric ring has at least 6 light elements. 
     
     
         10 . The ultra-high NA Fourier ptychographic imaging system of  claim 7 , wherein each concentric ring light elements separated by at least about 30 degrees. 
     
     
         11 . The ultra-high NA Fourier ptychographic imaging system of  claim 7 , wherein each concentric ring has a diameter of more than about 20 mm. 
     
     
         12 . The ultra-high NA Fourier ptychographic imaging system of  claim 7 , wherein each concentric ring has a diameter of more than about 40 mm. 
     
     
         13 . The ultra-high NA Fourier ptychographic imaging system of  claim 1 ,
 wherein the optical system comprises a collection optical element configured to receive light reflected from the sample, and   wherein the variable illuminator and the collection optical element are located to the same side of the sample in an epi-illumination mode.   
     
     
         14 . The ultra-high NA Fourier ptychographic imaging system of  claim 1 ,
 wherein the lens is configured to receive light reflected from the sample, and   wherein the variable illuminator and the lens optical element are located to the same side of the sample in an epi-illumination mode.   
     
     
         15 . The ultra-high NA Fourier ptychographic imaging system of  claim 1 , wherein adjacent overlapping regions of the plurality of overlapping regions have an overlapping area of at least about 20% to 90% of the area of one of the overlapping regions. 
     
     
         16 . The ultra-high NA Fourier ptychographic imaging system of  claim 1 , wherein adjacent overlapping regions of the plurality of overlapping regions have an overlapping area of at least about 70% of the area of one of the overlapping regions. 
     
     
         17 . The ultra-high NA Fourier ptychographic imaging system of  claim 1 , wherein adjacent overlapping regions of the plurality of overlapping regions have an overlapping area of at least about 75% of the area of one of the overlapping regions. 
     
     
         18 . The ultra-high NA Fourier ptychographic imaging system of  claim 1 , wherein adjacent overlapping regions of the plurality of overlapping regions have an overlapping area of at least about 2% and 99.5% of the area of one of the overlapping regions. 
     
     
         19 . A reflective-mode Fourier ptychographic imaging system, comprising:
 a variable illuminator configured to illuminate a sample at a plurality of incidence angles at different times in an epi-illumination mode;   an optical system comprising a filtering optical element having a filtering function, the optical system configured to receive light reflected from the sample and filter the light reflected from the sample using the filtering optical element, wherein the plurality of incidence angles and the filtering function correspond to overlapping regions in the Fourier domain; and   a radiation detector configured to acquire a plurality of intensity images, each intensity image corresponding to a different incidence angle of the plurality of incidence angles.   
     
     
         20 . The reflective-mode Fourier ptychographic imaging system of  claim 19 , further comprising a processor configured to generate an image with a higher resolution than a resolution of the intensity images by iteratively updating the overlapping regions in the Fourier domain with intensity image measurements. 
     
     
         21 - 25 . (canceled)