Metal oxy-flouride films based on oxidation of metal flourides

Abstract

An article comprises a body having a coating. The coating comprises a Y—O—F coating or other yttrium-based oxy-fluoride coating generated either by performing a fluorination process on a yttrium-based oxide coating or an oxidation process on a yttrium-based fluorine coating.

What is claimed is: 
     
         1 - 9 . (canceled) 
     
     
         10 . A chamber component for a processing chamber comprising an article composed of at least one of a metal or a ceramic and a yttrium-based oxy-fluoride layer on at least one surface of the article, the yttrium-based oxy-fluoride layer having a thickness of 10 nm to 10 μm, wherein the yttrium-based oxy-fluoride layer has a composition selected from a group consisting of Y—O—F, Y—Al—O—F, Y—Zr—O—F, and a composite ceramic comprising a first phase of Y—Al—O—F and a second phase of Y—Zr—O—F, the yttrium-based oxy-fluoride layer having been produced by a process comprising:
 performing atomic layer deposition (ALD), chemical vapor deposition (CVD) or ion assisted deposition (IAD) to deposit a yttrium-based fluoride coating approximately having the thickness of about 10 nm to about 10 microns onto a surface of the article; 
 heating the article to an elevated temperature of about 150-1500° C.; 
 exposing the article to an oxygen source comprising an oxygen-based plasma at the elevated temperature for a duration of about 0.5-72 hours; and 
 converting the yttrium-based fluoride coating into the yttrium-based oxy-fluoride coating. 
 
     
     
         11 . The chamber component of  claim 10 , wherein depositing the yttrium-based fluoride coating comprises one of:
 performing ALD to deposit the yttrium-based fluoride coating, the yttrium-based fluoride coating having a thickness of about 10 nm to about 10 μm;   performing EB-IAD or to deposit the yttrium-based fluoride coating, the yttrium-based fluoride coating having a thickness of about 1-10 μm; or   performing CVD or to deposit the yttrium-based fluoride coating, the yttrium-based fluoride coating having a thickness of about 100 nm-10 μm.   
     
     
         12 . The chamber component of  claim 10 , wherein the article comprises metal and the elevated temperature is about 150-650° C. 
     
     
         13 . The chamber component of  claim 10 , wherein exposing the chamber component to the oxygen source comprises performing at least one of flowing an O 2  plasma or flowing O 2  radicals. 
     
     
         14 . The chamber component of  claim 10 , wherein:
 the chamber component comprises a material having a first coefficient of thermal expansion (CTE) that is lower than a second CTE of the yttrium-based fluoride coating;
 the depositing of the yttrium-based fluoride coating is performed at a deposition temperature of about 150-300° C., wherein the yttrium-based fluoride coating has an internal tensile stress at temperatures below the deposition temperature and an internal compressive stress at temperatures above the deposition temperature; and 
 converting the yttrium-based fluoride coating into the yttrium-based oxy-fluoride coating causes a volume contraction and introduces a) reduced internal tensile stress at the temperatures below the deposition temperature that is lower than the internal tensile stress of the yttrium-based fluoride coating at the temperatures below the deposition temperature and b) increased internal compressive stress at the temperatures above the deposition temperature that is higher than the internal compressive stress of the yttrium-based fluoride coating at the temperatures above the deposition temperature. 
   
     
     
         15 . The chamber component of  claim 10 , wherein the yttrium-based fluoride coating is YF 3  and the yttrium-based oxy-fluoride coating is Y—O—F. 
     
     
         16 . The chamber component of  claim 10 , wherein the yttrium-based fluoride coating is a YF 3 —ZrF 4  solid solution and the yttrium-based oxy-fluoride coating is Y—Zr—O—F. 
     
     
         17 . The chamber component of  claim 10 , wherein the yttrium-based fluoride coating comprises an alternating stack of YF 3  layers having a first thickness and AlF 3  layers having a second thickness that is approximately 1/10 to ⅕ of the first thickness, and wherein the yttrium-based oxy-fluoride layer comprises an alternating stack of Y—O—F layers having the first thickness and Al—O—F layers having the second thickness. 
     
     
         18 . The chamber component of  claim 10 , wherein the yttrium-based oxy-fluoride coating comprises a composite ceramic comprising a first phase of Y—Al—O—F and a second phase of Y—Zr—O—F. 
     
     
         19 . A chamber component for a processing chamber comprising:
 an article composed of at least one of a metal or a ceramic;   a yttrium-based fluoride coating on the article, the yttrium-based fluoride coating having a thickness of 10 nm to 10 μm; and   a Y—O—F layer on the yttrium-based fluoride coating, the Y—O—F layer having a thickness of 10-500 nm, wherein an oxygen concentration in the Y—O—F layer is 10-60 at. %.   
     
     
         20 . The chamber component of  claim 19 , wherein the yttrium-based fluoride coating is a YF 3  coating.