Substrate processing apparatus

Abstract

A substrate processing apparatus includes a substrate stage that supports a substrate, a follower stage disposed on a same plane as the substrate stage, a first driving unit that moves the follower stage in parallel with a first direction, and a second driving unit that moves the substrate stage in parallel with the first direction. The second driving unit includes a voice magnet member disposed on the substrate stage, and a voice coil member disposed on the follower stage and spaced apart from the voice magnet member.

What is claimed is 
     
         1 . A substrate processing apparatus, comprising:
 a base frame;   a gantry disposed above the base frame; and   a moving stage unit that moves between the base frame and the gantry,   wherein the moving stage unit comprises:   a substrate stage that supports a substrate;   a follower stage disposed on the substrate stage;   a first driving unit that moves the follower stage in parallel with a first direction; and   a second driving unit that moves the substrate stage in parallel with the first direction,   wherein the second driving unit comprises:   a magnet member disposed on the substrate stage; and   a coil member disposed on the follower stage and spaced apart from the magnet member,   wherein the substrate stage comprises a through opening penetrating the substrate stage in a second direction crossing the first direction,   wherein the follower stage comprises a through member that passes through the through opening,   wherein the coil member is disposed on the through member,   wherein the magnet member is disposed in the through opening,   wherein the coil member comprises:   a first coil plate disposed on a first surface of the through member; and   a second coil plate disposed on a second surface of the through member, the second surface being spaced apart from the first surface in the first direction, and   wherein the magnet member comprises:   a first magnet including a first opening into which the first coil plate is inserted; and   a second magnet including a second opening into which the second coil plate is inserted, the second magnet being spaced apart from the first magnet in the first direction.   
     
     
         2 . The substrate processing apparatus of  claim 1 , further comprising a third driving unit that moves the substrate stage in parallel with the second direction,
 wherein the third driving unit comprises:   a motor coil member disposed on the through member; and   a motor magnet member disposed in the through opening.   
     
     
         3 . The substrate processing apparatus of  claim 2 , wherein the through member comprises an intermediate opening between the first surface and the second surface of the through member, and
 wherein the motor coil member is disposed in the intermediate opening.   
     
     
         4 . The substrate processing apparatus of  claim 1 , wherein, when the substrate stage moves in parallel with the first direction and is placed in a first location, the first driving unit moves the follower stage in parallel with the first direction such that the follower stage is placed in a location corresponding to the first location. 
     
     
         5 . The substrate processing apparatus of  claim 1 , further comprising:
 a first guide frame that supports a side of the follower stage; and   a second guide frame that supports an opposite side of the follower stage, wherein the second guide frame is spaced apart from the first guide frame in the second direction.   
     
     
         6 . The substrate processing apparatus of  claim 5 , wherein each of the first and second guide frames comprises:
 a guide portion that is elongated in the first direction and guides a movement of the follower stage;   a first support portion that supports a side of the guide portion; and   a second support portion that supports an opposite side of the guide portion, wherein the second support portion is spaced apart from the first support portion in the first direction.   
     
     
         7 . The substrate processing apparatus of  claim 6 , further comprising:
 a first balance mass that moves in parallel with the first direction along the guide portion of the first guide frame; and   a second balance mass that moves in parallel with the first direction along the guide portion of the second guide frame.   
     
     
         8 . The substrate processing apparatus of  claim 7 , wherein each of the first and second balance masses comprises:
 a balance body that includes a first groove extending in the first direction;   a motor magnet member that includes a second groove extending in the first direction, wherein the second groove is inserted into the first groove; and   a motor coil member that is disposed on each of the first and second guide frames, wherein the motor coil member is inserted into the second groove.   
     
     
         9 . The substrate processing apparatus of  claim 7 , wherein the first and second balance masses move in an opposite direction to that of the follower stage. 
     
     
         10 . The substrate processing apparatus of  claim 1 , wherein the follower stage is not in contact with the substrate stage. 
     
     
         11 . The substrate processing apparatus of  claim 1 , wherein the first magnet is spaced apart from the first coil plate. 
     
     
         12 . The substrate processing apparatus of  claim 11 , wherein a gap between the first magnet and the first coil plate is about 2 mm to about 6 mm. 
     
     
         13 . A substrate processing apparatus, comprising:
 a substrate stage that supports a substrate;   a follower stage disposed on the substrate stage;   a first driving unit that moves the follower stage in parallel with a first direction; and   a second driving unit that moves the substrate stage in parallel with the first direction,   wherein the second driving unit comprises:   a magnet member disposed on the substrate stage; and   a coil member disposed on the follower stage and spaced apart from the magnet member,   wherein the substrate stage comprises a through opening penetrating the substrate stage in a second direction crossing the first direction,   wherein the follower stage comprises a through member that passes through the through opening,   wherein the coil member is disposed on the through member,   wherein the magnet member is disposed in the through opening,   wherein the coil member comprises:   first coil plate disposed on a first surface of the through member; and   a second coil plate disposed on a second surface of the through member, the second surface being spaced apart from the first surface in the first direction, and   wherein the magnet member comprises:   a first magnet including a first opening into which the first coil plate is inserted; and   a second magnet including a second opening into which the second coil plate is inserted, the second magnet being spaced apart from the first magnet in the first direction.   
     
     
         14 . The substrate processing apparatus of  claim 13 , further comprising:
 a first guide frame that supports a side of the follower stage; and   a second guide frame that supports an opposite side of the follower stage, wherein the second guide frame is spaced apart from the first guide frame in the second direction.   
     
     
         15 . The substrate processing apparatus of  claim 14 , wherein each of the first and second guide frames comprises:
 a guide portion that is elongated in the first direction and guides a movement of the follower stage;   a first support portion that supports a side of the guide portion; and   a second support portion that supports an opposite side of the guide portion, wherein the second support portion is spaced apart from the first support portion in the first direction.   
     
     
         16 . The substrate processing apparatus of  claim 15 , further comprising:
 a first balance mass that moves in parallel with the first direction along the guide portion of the first guide frame; and   a second balance mass that moves in parallel with the first direction along the guide portion of the second guide frame.   
     
     
         17 . The substrate processing apparatus of  claim 16 , wherein each of the first and second balance masses comprises:
 a balance body that includes a first groove extending in the first direction;   a motor magnet member that includes a second groove extending in the first direction, wherein the second groove is inserted into the first groove; and   a motor coil member that is disposed on each of the first and second guide frames, wherein the motor coil member is inserted into the second groove.   
     
     
         18 . The substrate processing apparatus of  claim 13 , wherein the follower stage is not in contact with the substrate stage. 
     
     
         19 . The substrate processing apparatus of  claim 1 . 3 , wherein the first magnet is spaced apart from the first coil plate. 
     
     
         20 . The substrate processing apparatus of  claim 19 , wherein a gap between the first magnet and the first coil plate is about 2 mm to about 6 mm.