US2020056296A1PendingUtilityA1
Method of manufacturing electrocatalyst through one step electrodeposition and electrocatalyst manufactured therefrom
Est. expiryAug 16, 2038(~12.1 yrs left)· nominal 20-yr term from priority
B01J 27/1853C25B 1/04C25D 21/04C25D 3/562C25B 11/0478C25B 11/075C25B 11/059Y02E60/36C25D 5/625C25D 5/617C25D 5/18C25B 11/091C25B 11/057B01J 35/33
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Claims
Abstract
Disclosed is a method of manufacturing an electrocatalyst. The method may include forming a metal layer on a substrate, treating a substrate of the metal layer, and forming a catalyst layer on the metal layer by applying potential to an aqueous deposition solution including a nickel precursor, a copper precursor, a phosphorus precursor, and an additive, in which a molar ratio of the nickel precursor to the copper precursor may be greater than about 49:1. Accordingly, the present invention has an advantage in that the process of manufacturing the electrocatalyst may be simplified.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A method of manufacturing an electrocatalyst, comprising:
forming a metal layer on a substrate; treating a surface of the metal layer; and forming a catalyst layer on the surface-treated metal layer by applying potential to an aqueous deposition solution comprising a nickel precursor, a copper precursor, a phosphorus precursor, and an additive, wherein a molar ratio of the nickel precursor to the copper precursor is greater than about 49:1.
2 . The method of claim 1 , wherein the metal layer comprises a nickel layer or a copper layer.
3 . The method of claim 1 , wherein the treating the surface comprises treating the surface using a UV-ozone cleaning treatment.
4 . The method of claim 1 , wherein the potential is applied by a cyclic voltammetry method.
5 . The method of claim 4 , wherein a range of the potential is of about −1.2 to 0.2 V.
6 . The method of claim 5 , wherein a frequency at which the range of the potential is applied is of about 3 to 15 times.
7 . The method of claim 1 , wherein a molar concentration of the nickel precursor is of about 0.02 to 0.5 M.
8 . The method of claim 1 , wherein the nickel precursor comprises one or more of nickel sulfate, nickel nitrate, and nickel acetate.
9 . The method of claim 1 , wherein a molar concentration of the copper precursor is of about 0.001 to 0.02 M.
10 . The method of claim 1 , wherein the copper precursor comprises one or more of copper sulfate, copper nitrate, copper acetate, and copper acetylacetonate.
11 . The method of claim 1 , wherein the additive comprises sodium acetate, and further comprises glycine or citric acid.
12 . The method of claim 11 , wherein a molar ratio of the nickel precursor to sodium acetate, glycine, or citric acid is about 1:about 0.5 or greater and about 1:less than about 2.
13 . The method of claim 11 , wherein a molar concentration of each of sodium acetate, glycine, and citric acid is of about 0.05 or greater and less than about 0.2 M.
14 . The method of claim 1 , wherein a molar ratio of the nickel precursor to the phosphorus precursor is of about 1:5 to 1:20.
15 . The method of claim 1 , wherein a molar concentration of the phosphorus precursor is of about 0.1 to 1.25 M.
16 . The method of claim 1 , wherein the phosphorus precursor comprises sodium hypophosphite.
17 . The method of claim 1 , wherein the substrate is pretreated using an oxygen plasma etching process.
18 . An electrocatalyst comprising an oxygen generation electrode and a hydrogen generation electrode,
wherein at least one of the electrodes comprises a substrate and a catalyst layer electrodeposited onto the substrate, and the catalyst layer comprises greater than about 65 at % of nickel; and less than about 35 at % of copper, based on 100 at % of metal atoms.
19 . The electrocatalyst of claim 18 , further comprising a metal layer between the substrate and the catalyst layer.
20 . The electrocatalyst of claim 19 , wherein the metal layer comprises a nickel layer or a copper layer.
21 . A vehicle part comprising an electrocatalyst of claim 19 .Join the waitlist — get patent alerts
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