Fabrication of low defectivity electrochromic devices
Abstract
Prior electrochromic devices frequently suffer from high levels of defectivity. The defects may be manifest as pin holes or spots where the electrochromic transition is impaired. This is unacceptable for many applications such as electrochromic architectural glass. Improved electrochromic devices with low defectivity can be fabricated by depositing certain layered components of the electrochromic device in a single integrated deposition system. While these layers are being deposited and/or treated on a substrate, for example a glass window, the substrate never leaves a controlled ambient environment, for example a low pressure controlled atmosphere having very low levels of particles. These layers may be deposited using physical vapor deposition.
Claims
exact text as granted — not AI-modified1 - 43 . (canceled)
44 . An electrochromic device comprising:
a substrate; an electrochromic layer disposed on or over the substrate, said electrochromic layer comprising a cathodically tinting electrochromic material; and a counter electrode layer also disposed on or over the substrate, said counter electrode layer comprising
(a) a first sublayer comprising a first anodically tinting material, and
(b) a second sublayer comprising a second anodically tinting material,
wherein compositions of the first and second anodically tinting materials are different.
45 . The electrochromic device of claim 44 , wherein the compositions of the first and second anodically tinting materials are graded.
46 . The electrochromic device of claim 44 , wherein the electrochromic layer comprises tungsten-containing material.
47 . The electrochromic device of claim 46 , wherein the electrochromic layer comprises tungsten oxide.
48 . The electrochromic device of claim 47 , wherein the electrochromic layer is doped with one or more dopants selected from the group consisting of lithium, sodium, potassium, molybdenum, vanadium, titanium, and combinations thereof.
49 . The electrochromic device of claim 44 , wherein the counter electrode layer comprises nickel-containing material.
50 . The electrochromic device of claim 49 , wherein the counter electrode layer comprises nickel oxide.
51 . The electrochromic device of claim 50 , wherein the counter electrode layer is doped with one or more dopants selected from the group consisting of tantalum and tungsten.
52 . The electrochromic device of claim 44 , further comprising an ion conducting layer.
53 . The electrochromic device of claim 52 , further wherein the ion conducting layer comprises a compound selected from the group consisting of silicon-aluminum-oxide, lithium silicon-aluminum-oxide, lithium silicate, lithium aluminum silicate, lithium aluminum borate, lithium aluminum fluoride, lithium borate, lithium nitride, lithium zirconium silicate, lithium niobate, lithium borosilicate, and lithium phosphosilicate.
54 . The electrochromic device of claim 52 , wherein the ion conducting layer comprises a silicon oxide.
55 . The electrochromic device of claim 44 , wherein the first and second sublayers have different thicknesses.
56 . The electrochromic device of claim 44 , wherein the first and second sublayers have different morphologies.
57 . The electrochromic device of claim 44 , wherein the first and second sublayers have different optical properties.
58 . An electrochromic device comprising:
a substrate; an electrochromic layer disposed on or over the substrate, said electrochromic layer comprising a cathodically tinting electrochromic material; and a counter electrode layer also disposed on or over the substrate, said counter electrode layer comprising
(a) a first sublayer comprising a first anodically tinting material, and
(b) a second sublayer comprising a second anodically tinting material,
wherein the first and second anodically tinting materials have different optical properties.
59 . The electrochromic device of claim 58 , wherein compositions of the first and second anodically tinting materials are graded.
60 . The electrochromic device of claim 58 , wherein the electrochromic layer comprises tungsten-containing material.
61 . The electrochromic device of claim 60 , wherein the electrochromic layer comprises tungsten oxide.
62 . The electrochromic device of claim 61 , wherein the electrochromic layer is doped with one or more dopants selected from the group consisting of lithium, sodium, potassium, molybdenum, vanadium, titanium, and combinations thereof.
63 . The electrochromic device of claim 58 , wherein the counter electrode layer comprises nickel-containing material.
64 . The electrochromic device of claim 63 , wherein the counter electrode layer comprises nickel oxide.
65 . The electrochromic device of claim 64 , wherein the counter electrode layer is doped with one or more dopants selected from the group consisting of tantalum and tungsten.
66 . The electrochromic device of claim 58 , further comprising an ion conducting layer.
67 . The electrochromic device of claim 66 , wherein the ion conducting layer comprises a compound selected from the group consisting of silicon-aluminum-oxide, lithium silicon-aluminum-oxide, lithium silicate, lithium aluminum silicate, lithium aluminum borate, lithium aluminum fluoride, lithium borate, lithium nitride, lithium zirconium silicate, lithium niobate, lithium borosilicate, and lithium phosphosilicate.
68 . The electrochromic device of claim 66 , wherein the ion conducting layer comprises a silicon oxide.
69 . The electrochromic device of claim 58 , wherein the first and second sublayers have different thicknesses.
70 . The electrochromic device of claim 58 , wherein the first and second sublayers have different morphologies.
71 . An electrochromic device comprising:
a substrate; an electrochromic layer comprising tungsten oxide disposed on or over the substrate, said electrochromic layer comprising a cathodically tinting electrochromic material; an ion conducting layer comprising a compound selected from the group consisting of silicon-aluminum-oxide, lithium silicon-aluminum-oxide, lithium silicate, lithium aluminum silicate, lithium aluminum borate, lithium aluminum fluoride, lithium borate, lithium nitride, lithium zirconium silicate, lithium niobate, lithium borosilicate, lithium phosphosilicate, and silicon oxide; and a counter electrode layer comprising nickel oxide, also disposed on or over the substrate, said counter electrode layer comprising
(a) a first sublayer comprising a first anodically tinting material, and
(b) a second sublayer comprising a second anodically tinting material,
wherein the first and second anodically tinting materials have different compositions.
72 . The electrochromic device of claim 71 , wherein the counter electrode layer is doped with one or more dopants selected from the group consisting of tantalum and tungsten.
73 . The electrochromic device of claim 71 , wherein the electrochromic layer is doped with one or more dopants selected from the group consisting of lithium, sodium, potassium, molybdenum, vanadium, titanium, and combinations thereof.Join the waitlist — get patent alerts
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