US2020039007A1PendingUtilityA1
Bonding member, method for producing bonding member and method for producing bonding structure
Est. expiryFeb 23, 2037(~10.6 yrs left)· nominal 20-yr term from priority
H10W 72/952H10W 72/923H10W 72/59H10W 72/01938H10W 72/07331H10W 72/07334H10W 72/07332H10W 72/073H10W 72/07341H10W 72/348H10W 72/354H10W 72/325H10W 72/352H10W 72/321H10W 72/01351H10W 90/736H10W 90/734H10W 72/351H10W 72/07355B23K 20/16B23F 1/02B23K 2101/40B23K 20/24C22F 1/14B23K 35/3006B23K 20/023B23K 20/021H01L 24/27H01L 24/29H01L 2924/01047H10W 72/013C22C 5/06B32B 15/01
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Claims
Abstract
A bonding member (10) includes surface-processed silver surfaces (11a, 11b).
Claims
exact text as granted — not AI-modified1 . A bonding member that bonds a first bonding target and a second bonding target together through heating, comprising a surface-processed silver surface, wherein
the surface-processed silver surface is ground.
2 . The bonding member of claim 1 , wherein
the silver surface is supplied with a compressive stress.
3 . The bonding member of claim 1 , wherein
there are 10 or more grain boundaries, between silver grains, per micrometer at the silver surface.
4 . The bonding member of claim 1 , wherein
the silver grains each have a size of 1 μm or shorter at the silver surface.
5 . The bonding member of claim 1 , wherein
the bonding member has a thickness of 50 μm or greater and 300 μm of less.
6 . (canceled)
7 . (canceled)
8 . The bonding member of claim 1 , wherein
the silver surface is a part of a surface of a surface-processed porous silver sheet.
9 . A method for producing a bonding member that bonds a first bonding target and a second bonding target together through heating, comprising:
preparing a silver layer; and processing a surface of the silver layer, wherein in the processing the surface of the silver layer, the surface of the silver layer is ground to process the surface of the silver layer.
10 . (canceled)
11 . (canceled)
12 . The method for producing the bonding member of claim 9 , wherein
in the processing of the surface of the silver layer, the surface of the silver layer is processed such that the number of grain boundaries, between silver grains, at the surface of the silver layer is larger than that in a pre-processing state.
13 . The method for producing the bonding member of claim 9 , wherein
the silver layer is a porous silver sheet including pores.
14 . The method for producing the bonding member of claim 13 , wherein
in the processing of the surface of the silver layer, the surface of the silver layer is processed such that the number of the pores at the surface of the silver layer is smaller than that in a pre-processing state.
15 . A method for producing a bonding structure, comprising:
preparing a first bonding target, a second bonding target, and a bonding member; forming a stack body including the first bonding target, the bonding member, and the second bonding target stacked such that the bonding member is located between the first bonding target and the second bonding target; and heating the stack body to bond the first bonding target and the second bonding target to each other via the bonding member, wherein in the preparing of the bonding member, the bonding member includes a surface-processed silver surface, and the surface-processed silver surface is ground.
16 . The method for producing the bonding structure of claim 15 , wherein
in the preparing of the first bonding target, the second bonding target, and the bonding member, the bonding member is separate from the first bonding target and the second bonding target.
17 . The method for producing the bonding structure of claim 15 , wherein
in the preparing of the first bonding target, the second bonding target, and the bonding member, the bonding member is formed in advance on at least one of the first bonding target and the second bonding target.
18 . The method for producing the bonding structure of claim 15 , wherein
in the bonding of the first bonding target and the second bonding target, the stack body is heated at a temperature of 150° C. or higher and 350° C. or lower.Join the waitlist — get patent alerts
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