Method And Apparatus For Automatic Chromatography Of Thin-Layer Plates
Abstract
A method for the automatic chromatography of thin-layer plates for thin-layer chromatography with a development chamber 1 in which a thin-layer plate D is completely enclosed, sealed-off and isolated from the external environment. In the development chamber, a front space containing an inner atmosphere is located on the front face of the separation layer of the thin-layer plate. The depth of the front space is about 2 mm and a maximum 3 mm. An inlet is provided at one end of the front space and an outlet is provided at the other end of the front space. During the chromatographic development, a stream of gas of particular composition determined by the user is created throughout the entire front space, the entire inner atmosphere being set in motion, without stagnant or stationary gas phase.
Claims
exact text as granted — not AI-modifiedWe claim:
1 . A method for the automatic chromatography of thin-layer plates for thin-layer chromatography with a development chamber in which a thin-layer plate is completely enclosed, sealed-off and isolated from the external environment, wherein a front space containing an inner atmosphere is located in the development chamber on a front face of a separation layer of the thin-layer plate, comprising the following steps:
adjusting moisture of the separation layer of the thin-layer plate; and saturating the inner atmosphere with a specific gas phase composition and defined loading of the separation layer of the thin-layer plate with at least one substance, wherein during at least one of these steps, a stream of gas having a particular composition determined by a user is generated throughout the entire front space, and the entire inner atmosphere is set in motion, without stagnant or a stationary gas phase.
2 . The method according to claim 1 ,
the stream of gas drives the inner atmosphere already in the front space frontally out of the development chamber, without turbulences and without mixing with it, so that the inner atmosphere is completely renewed with the stream of gas.
3 . The method according to claim 1 ,
the flow rate of the stream of gas is set such that the flowing inner atmosphere remains in the front space only for a short time, so that its composition does not change significantly during the flow through the development chamber and is renewed continually.
4 . The method according to claim 1 ,
a front side of the thin-layer plate on which the separation layer is located is isolated from the rear side of the thin-layer plate.
5 . The method according to claim 1 ,
the stream of gas acts directly, strongly and uniformly on the surface of the separation layer.
6 . The method according to claim 1 , further comprising the following steps of:
adjusting moisture of the separation layer of the thin-layer plate; saturating the inner atmosphere with a specific gas phase composition and defined loading of the separation layer of the thin-layer plate with at least one substance; introducing an eluent; regulating an eluent level and detecting an eluent front; removing the eluent; and drying the thin-layer plate.
7 . The method according to claim 1 ,
the steps follow each other automatically, so that the whole method proceeds autonomously and without manual interaction.
8 . An apparatus for automatic chromatography of thin-layer plates for thin-layer chromatography with a development chamber in which a thin-layer plate is completely enclosed, sealed-off and isolated from the external environment, wherein a front space is located in the development chamber on a front face of the separation layer of the thin-layer plate, and an eluent trough is located at the lower end of the front space, at least one inlet is provided at one end of the front space and at least one outlet is provided at the other end of the front space, the outlet has an outlet entry opening in the front space outside the fluid trough; and
the depth of the front space is approximately 2 mm, maximum 3 mm.
9 . The apparatus according to claim 8 , wherein:
the at least one inlet comprises at least one inlet exit opening, the at least one outlet includes at least one outlet entry opening, and the at least one inlet exit opening and the at least one outlet entry opening are distributed over the entire width of a rear wall of the cavity of the development chamber.
10 . The apparatus according to claim 8 , wherein:
a rear wall of the cavity of the development chamber has a raised U-shaped support surface against which a front side of a thin-layer plate can be leaned, so that the front space is surrounded by the support surface on at least 3 sides.
11 . The apparatus according to claim 8 , wherein:
the at least one inlet has a laminating region with channels which are shorter, the farther they are from the entrance of the laminating region.
12 . The apparatus according to claim 8 , wherein:
the at least one inlet has a laminating region, the laminating region being provided with parallel and regularly spaced fins.
13 . Apparatus according to claim 8 , wherein:
the at least one inlet has an inclined segment, wherein the inclined segment leads to the front space and is oriented at an angle of inclination of at most 45° with respect to the rear wall of the cavity of the development chamber.
14 . The apparatus according to claim 8 , wherein:
the inlet outlet includes at least one outlet entry opening into the front space, at least one outlet channel and at least one outlet exit opening, each outlet entry opening being connected with its own outlet channel to the outlet exit opening, the outlet channel having the same length and the at least one outlet channel having a bent or zigzag-shaped.
15 . The apparatus according to claim 8 , wherein:
the development chamber has a door which is rotatable or slidable between a closed position and an open position for sealing-off of the cavity of the development chamber, at least one of the door and the development chamber are provided with an inflatable seal.Join the waitlist — get patent alerts
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